In recent years, focused ion beam (FIB) processing has been developed into a well-established and promising technique in nearly all fields of nanotechnology for patterning and prototyping on the μm-scale and below. Liquid metal alloy ion sources (LMAIS) represent a promising alternative to expand the FIB application fields besides all other source concepts. The need of light elements like Li was investigated using various alloys. A promising candidate is a Ga35Bi60Li5 based LMAIS, which is introduced in more detail and which operates stably for more than 1000 μA h. It enables a highly resolved imaging with (4.0 ± 0.6) nm edge resolution (20%–80%) and patterning using Li, Ga, or heavy polyatomic Bi clusters, all coming from one ion source.