A new edge lithographic technique for fabricating mixed micrometer- and nanometer-sized patterns is developed. The process starts with silicon step-pattern fabrication and the nanosized patterns are subsequently obtained using edge lithography on the initial pattern. Micropatterns are obtained by skipping the edge lithography process and directly using the initial step pattern as the micropattern. The nanopatterned region is defined by photolithography. Two different patterns are obtained: one pattern has microscale (1.2 μm) and nanoscale (80 nm) widths and a height of 500 nm; and the other pattern has submicroscale (0.29 μm) and nanoscale (40 nm) widths and a height of 100 nm. It is clearly shown that the developed edge lithography process is useful for fabricating mixed micro- and nanopatterns.