Abstract
This paper presents UV imprinting methods for fabricating a high-aspect-ratio pillar array. A polydimethylsiloxane (PDMS) mold was selected as the UV imprinting mold. The pillar pattern was formed on a 50 × 50 mm2 area on a polyethylene terephthalate (PET) film without remarkable deformation. The aspect ratios of the pillar and space were about four and ten, respectively. The mold was placed into contact with a UV-curable resin under a reduced pressure, and the resin was cured by UV light irradiation after exposure to atmospheric pressure. The PDMS mold showed good mold releasability and high flexibility. By moderately pressing the mold before UV-curing, the thickness of the residual layer of the imprinted resin was reduced and the pattern was precisely imprinted. Both batch pressing and roll pressing are available.
Highlights
Micro/nanofabrication technologies are indispensable for fabricating functional electronic, optical, medical and biochemical devices
The resin-coated polyethylene terephthalate (PET) film and PDMS mold were set in UV imprinting equipment (ST50, Toshiba Machine Co., Ltd., Numadu, Japan) (Figure 3a)
The pillar pattern was formed on the entire PET film area
Summary
Micro/nanofabrication technologies are indispensable for fabricating functional electronic, optical, medical and biochemical devices. These methods include deep-reactive ion etching (DRIE) [1,2], X-ray lithography [3,4,5], UV lithography [6,7,8,9] and laser abrasion [10,11] Because these fabrication methods provide low-throughput and are not cost-effective, successive molding technologies, such as injection molding, hot embossing and UV imprinting [3,7,8,9,12,13,14,15,16,17,18,19,20,21,22,23] are required for mass production. The following sections explain our experimental methodology, present and discuss our results and provide a conclusion
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