Abstract
UV curing nanoimprint lithography is one of the most promising techniques for the fabrication of micro- to nano-sized patterns on various substrates with high throughput and a low production cost. The UV nanoimprint process requires a transparent template with micro- to nano-sized surface protrusions, having a low surface energy and good flexibility. Therefore, the development of low-cost, transparent, and flexible templates is essential. In this study, a flexible polyethylene terephthalate (PET) film coated with a fluorinated polymer material was used as an imprinting mold. Micro- and nano-sized surface protrusion patterns were formed on the fluorinated polymer layer by the hot embossing process from a Si master template. Then, the replicated pattern of the fluorinated polymer, coated on the flexible PET film, was used as a template for the UV nanoimprint process without any anti-stiction coating process. In this way, the micro- to nano-sized patterns of the original master Si template were replicated on various substrates, including a flat Si substrate and curved acryl substrate, with high fidelity using UV nanoimprint lithography.
Highlights
In order to form micro- to nano-sized patterns, various lithographic technologies have been used, such as DUV photolithography [1], e-beam lithography [2,3], X-ray lithography [4,5], laser holographic lithography [6], nanosphere lithography [7], scanning probe microscopy lithography [8], and so on
Both the hot embossing and UV nanoimprint patterning processes were done on large size substrates without any noticeable defects
Due to the slightly tapered profile of the patterns of the Si master mold and elastic nature of the hot embossing process of the fluorinated polymer, the hot-embossed patterns on the polyethylene terephthalate (PET) films were slightly smaller than the patterns of the Si master mold
Summary
In order to form micro- to nano-sized patterns, various lithographic technologies have been used, such as DUV photolithography [1], e-beam lithography [2,3], X-ray lithography [4,5], laser holographic lithography [6], nanosphere lithography [7], scanning probe microscopy lithography [8], and so on. Except for DUV photolithography, these conventional lithography technologies require either a complicated patterning system with a high process cost or offer limited throughput and, are not suitable for mass production. None of these technologies allow micro- to nano-sized patterns to be formed on a non-flat surface. UV nanoimprint templates need to have high stiffness in order for the nano-sized protrusion patterns to be transferred to the substrate and sufficient flexibility for conformal contact to be achieved over a large-sized
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