High-performance Thin-film Transistors Research Articles

Combustion-assisted low-temperature ZrO2/SnO2 films for high-performance flexible thin film transistors

We developed high-performance flexible oxide thin-film transistors (TFTs) using SnO2 semiconductor and high-k ZrO2 dielectric, both formed through combustion-assisted sol-gel processes. This method involves the exothermic reaction of fuels and oxidizers to produce high-quality oxide films without extensive external heating. The combustion ZrO2 films were revealed to have an amorphous structure with a higher proportion of oxygen corresponding to the oxide network, which contributes to the low leakage current and frequency-independent dielectric properties. The ZrO2/SnO2 TFTs fabricated on flexible substrates using combustion synthesis exhibited excellent electrical characteristics, including a field-effect mobility of 26.16 cm2/Vs, a subthreshold swing of 0.125 V/dec, and an on/off current ratio of 1.13 × 106 at a low operating voltage of 3 V. Furthermore, we demonstrated flexible ZrO2/SnO2 TFTs with robust mechanical stability, capable of withstanding 5000 cycles of bending tests at a bending radius of 2.5 mm, achieved by scaling down the device dimensions.

Comparative Study of Atomic Layer Deposition Supercycle Design Effects on Reliability in Heterogeneous IGZO Channel TFTs

Oxide semiconductor thin-film transistors (TFTs) are promising candidates for application in display backplanes and memory devices. To ensure both high performance and stable electrical properties of oxide TFTs over long-term use, superior mobility and device stability need to be obtained. In this regard, atomic layer deposition (ALD) has gained attention as a facile method for obtaining conformal oxide films under defect-free conditions and adjusting the composition or distribution for targeted TFT performance. Here, we propose that, even with the same bulk composition, variations in the local composition using an ALD supercycle design can significantly affect the TFT performance, particularly the bias-temperature stability. To ascertain the influence of the local cation distribution on the performance, we compared two supercycle designs by reversing the sub-cycles of indium, gallium, and zinc with identical bulk In–Ga–Zn ratios. Despite minimal changes in the electrical characteristics, such as the mobility and threshold voltage, of the two TFTs designed with ALD supercycles, there was a significant difference in their reliability. Devices with an indium-rich IGZO active layer on the back channel exhibited a hump phenomenon and approximately five times greater Vth degradation (ΔVth: -0.67 V to -3.36 V). By conducting an additional case study of IGZO TFTs and film analysis, we confirmed that mobility is largely governed by the bulk composition, whereas the local surface composition, serving as the back channel, is the key to reliability. The device performance results could be confirmed through the surface and bulk analyses of heterogeneous films engineered through the ALD supercycle design. Furthermore, it has been proposed that optimizing the ALD supercycle design is the key to obtaining high-performance oxide semiconductor TFTs.

A Tricyclic Framework with Integrated B←N and Cyano Dual Functionalization for Superior n-Type Organic Electronics.

n-Type conjugated polymers featuring low-lying lowest unoccupied molecular orbital (LUMO) energy levels are essential for achieving high-performance n-type organic thin-film transistors (OTFTs) and organic thermoelectrics (OTEs). However, the synthesis of acceptors with strong electron-withdrawing characteristics presents a significant challenge. Herein, a peripheral functionalization strategy is employed on the widely used tricyclic framework anthracene by introducing dual N,O-bidentate BF2/B(CN)2 groups to enhance its electron-withdrawing capability. This approach successfully navigates synthetic challenges, leading to the development of two novel acceptor building blocks: DBNF and DBNCN. Compared to the counterparts with a single N,O-bidentate BF2/B(CN)2 moiety, DBNF and DBNCN exhibit an extended π-backbone, enhanced molecular packing, and improved electron-withdrawing properties. Utilizing these innovative acceptor monomers, copolymers, PDBNF and PDBNCN, are synthesized, which exhibit considerably suppressed LUMO ≈ -4.0 eV. The deep LUMO of PDBNF together with its favourable bimodal packing orientation leads to remarkable electron mobility of 3.04 cm² V⁻¹ s⁻¹ with improved stability in OTFTs. Importantly, efficient n-doping in OTEs is achieved with PDBNCN, exhibiting exceptional conductivity of 95.5 S cm⁻¹ and a maximum power factor of 147.8 μW m⁻¹ K⁻²-among the highest reported for solution-processed n-type polymers.

Plasma-enhanced atomic layer deposition of indium-free ZnSnOx thin films for thin-film transistors

An appropriate synthesis technique for growing high-quality indium-free ZnSnOx (ZTO) films should be developed to achieve high-performance thin-film transistors (TFTs) utilizing ZTO films. This study investigated the growth characteristics and electrical properties of ZTO thin films grown via plasma-enhanced atomic layer deposition (PEALD) using bis(1-dimethylamino-2-methyl-2-propoxide)Sn, diethylzinc, and O2 plasma to optimize the composition and enhance the device performance. Deviations were observed in the growth per cycle when using PEALD for ZTO, compared with binary oxides. In the PEALD of the ZTO films, the introduction of the SnO2 sub-cycle enhanced the mass gain in the ZnO sub-cycle, whereas the mass gain in the SnO2 sub-cycle decreased with the addition of the ZnO sub-cycle. This was attributed to changes in the density of the functional groups on the reaction surface. Precise control over the composition was achieved, enabling the identification of the optimal Zn58Sn42Ox composition. Post-deposition annealing significantly improved the TFT performance, with devices showing enhanced mobility, positive shifts in the threshold voltage, and reduced subthreshold swing values. These improvements stemmed from reductions in oxygen vacancies and sub-gap defect states. These findings highlight the potential of PEALD-grown ZTO films for use in high-performance, cost-effective TFTs, facilitating their integration into modern semiconductor electronics.

Novel solution-gated transistor sensor-based SnO2 epitaxial thin films grown by pulsed laser deposition for nitrite detection.

A solution-gate controlled thin-film transistor with SnO2 epitaxial thin films (SnO2-SGTFT) is successfully utilized for highly sensitive detection of nitrite. The SnO2 films are deposited as channel materials on a c-plane sapphire (c-Al2O3) substrate through pulsed laser deposition (PLD), with superior crystal quality and out-of-plane atomic ordering. PtAu NPs/rGO nanocomposites are electrodeposited on agold electrode to function as a transistor gate to further enhance the nitrite catalytic performance of thedevice. The change in effective gate voltage due to the electrooxidation of nitrite on the gate electrode is the primary sensing mechanism of the device. Based on the inherent amplification effect of transistors, the superior electrical properties of SnO2, and the high electrocatalytic activity of PtAu NPs/rGO, the SnO2-SGTFT sensor has a low detection limit of 0.1nM and a wide linear detection range of 0.1nM ~ 50mM at VGS = 1.0V. Furthermore, the sensor has excellent characteristics such as rapid response time, selectivity, and stability. The practicability of the device has been confirmed by the quantitative detection of nitrite in natural lake water. SnO2 epitaxial films grown by PLD provide a simple and efficient way to fabricate nitrite SnO2-SGTFT sensors in environmental monitoring and food safety, among others. It also provides a reference for the construction of other high-performance thin-film transistor sensors.

Junctionless Structure Indium-Tin Oxide Thin-Film Transistors Enabling Enhanced Mechanical and Contact Stability.

In recent years, considerable attention has focused on high-performance and flexible crystalline metal oxide thin-film transistors (TFTs). However, achieving both high performance and flexibility in semiconductor devices is challenging due to the inherently conductive and brittle nature of crystalline metal oxide. In this study, we propose a facile way to overcome this limitation by employing a junctionless (JL) TFT structure via oxygen plasma treatment of the crystalline indium-tin oxide (ITO) films. The oxygen plasma treatment significantly reduced oxygen vacancies in the ITO films, contributing to the significant reduction in the carrier concentration from 4.67 × 1020 to 1.39 × 1016. Importantly, this reduction was achieved without inducing any noticeable structural changes in the ITO, enabling the successful realization of ITO JL TFTs with an adjustable threshold voltage. Furthermore, the ITO JL TFTs demonstrate good stability and reliability under various bias stress conditions, aging in the air atmosphere, and high-temperature processes. In addition, the ITO JL TFTs exhibit low light sensitivity due to the wide bandgap of ITO and further suppression of Vo defects, making them suitable for applications requiring stable performance under light exposure. To compare and analyze the flexibility of the JL structure and conventional structure with additional source/drain (S/D) junction in ITO TFTs with nonencapsulation, we utilized mechanical simulations and transmission line method (TLM). By employing the JL structure in ITO TFT through carefully optimized oxygen plasma treatment, we successfully mitigated stress concentration at the S/D-channel interface. This resulted in a JL ITO TFT that exhibited a change in contact resistance of less than 20% even after 20,000 bending cycles. Consequently, a stable and flexible ITO TFT with field-effect mobility (μFE) of 12.74 cm2/(V s) was realized, outperforming conventionally structured ITO TFTs with additional S/D junction, where the contact resistance nearly tripled.

Fully atomic layer deposition induced InAlO thin film transistors

The atomic layer deposition (ALD) technique has been extensively utilized for depositing metal oxide (MO) thin films, particularly as gate insulators in thin film transistors (TFTs). However, research on MO semiconductors as channel layer materials in TFTs using ALD is limited, especially for fully ALD-fabricated MO TFTs. In this study, fully ALD-fabricated InAlO TFTs were developed, with optimized aluminum doping content and annealing temperature to enhance the electrical properties and stability. The InAlO TFTs, fabricated with a cycle ratio of 15:1 and annealed at 350 °C, exhibit superior performance, including a field-effect mobility of 7.2 cm2/V·s, a subthreshold swing of 165 mV/decade, and an on/off current ratio of 2.3 × 106, with a threshold voltage of only 0.1 V. Additionally, they demonstrated good stability, with a threshold voltage shift of 0.11 V under positive bias stress. The improved electrical properties and stability are attributed to reduced carrier concentration and the inhibition of oxygen defect generation, achieved through appropriate annealing temperatures and aluminum doping. Thus, the development of fully ALD-fabricated high-performance TFTs holds promise for next-generation display technologies as pixel-driving circuits.

High-Performance Tin Oxide Thin-Film Transistors Realized by Codoping and Their Application in Logic Circuits.

Tin oxide is a promising channel material, offering the advantages of being low-cost and environmentally friendly and having a wide band gap. However, despite the high electron mobility of SnO2 in bulk, the corresponding thin-film transistors (TFTs) generally exhibit moderate performance, hindering their widespread application. Herein, we proposed a codoping strategy to improve both the electrical property and the stability of SnO2 TFTs. A comparative analysis between doped and undoped SnO2 was conducted. It is observed that taking advantage of the difference in ionic radii between two dopants (indium and gallium) and the tin ions in the host lattice can effectively reduce impurity-induced strain. Additionally, we investigated the effect of codoping content on SnO2 TFTs. The optimal codoped SnO2 (TIGO) TFTs demonstrate high performance, featuring a field-effect mobility of 15.9 cm2/V·s, a threshold voltage of 0.2 V, a subthreshold swing of 0.5 V/decade, and an on-to-off current ratio of 2.2 × 107. Furthermore, the devices show high stability under both positive and negative bias stress conditions with a small threshold voltage shift of 1.8 and -1.2 V, respectively. Utilizing the TIGO TFTs, we successfully constructed a resistor-loaded unipolar inverter with a high gain of 10.76. This study highlights the potential of codoped SnO2 TFTs for advanced applications in electronic devices.

One-volt oxide based complementary circuit

In low-power electronics, there is a substantial demand for high-performance p-type oxide thin-film transistors (TFTs) that are capable of efficient operation at low voltages. In this study, we employ anodization to form an aluminum oxide gate dielectric layer, enabling the fabrication of p-type tin oxide (SnO) TFTs that effectively operate at a low voltage of 1 V. Under optimal device fabrication conditions, the SnO TFT demonstrates an on/off current ratio exceeding 103 and a saturation mobility of 1.94 cm2 V−1 s−1 at 1 V operation. The optimal SnO TFT fabrication conditions are subsequently used to fabricate a complementary inverter, comprising a SnO TFT and an n-type indium gallium zinc oxide TFT, achieving a gain of up to 38 at a 1 V supply voltage. Notably, the inverter’s switching point voltage is finely tuned to the ideal value, precisely half of the supply voltage. This oxide-based complementary inverter showcases promising potential in low-power electronics.

High-performance tin perovskite transistors through formate pseudohalide engineering

The lack of high-performance p-type semiconducting materials hinders the integration of complementary metal-oxide semiconductors with well-established n-type metal-oxide counterparts. Although tin halide perovskites are promising p-type material candidates, their practical implementation is hindered by excessive hole concentrations and difficulties in precisely controlling crystallization, which leads to poor device performance and yield. In this paper, we propose a formate pseudohalide engineering method to overcome these issues and demonstrate high-performance tin perovskite thin-film transistors (TFTs). The incorporation of formate anion greatly suppresses the vacancy defects at the surfaces of the perovskite films with an increase in crystallinity and grain size. This reduces the hole concentration and eliminates the dependence on the addition of excessive tin fluoride for hole suppression. Hence, high-performance TFTs with a high average field-effect hole mobility of 57.34 cm2 V−1 s−1 and on/off current ratios surpassing 108 can be achieved, approaching p-channel low-temperature polysilicon devices.

Role of ultrathin Ti3C2Tx MXene layer for developing solution-processed high-performance low voltage metal oxide transistors

Metal oxide transistors have garnered substantial attention for their potential in low-power electronics, yet challenges remain in achieving both high performance and low operating voltages through solution-based fabrication methods. Optimizing interfacial engineering at the dielectric/semiconductor interface is of utmost importance in the fabrication of high-performance thin film transistors (TFTs). In the present article, a bilayer Ti3C2Tx-MXene/SnO2–semiconductor (Tx stands for surface termination) configuration is used to fabricate a high-performance n-type thin film transistor by using an ion-conducting Li-Al2O3 gate dielectric on a p+-Si substrate, where electrical charges are formed and modulated at the Li-Al2O3/SnO2 interface, and Ti3C2Tx-MXene nanosheets serve as the primary electrical charge channel due to their long lateral size and high mobility. A comparative characterization of two distinct TFTs is conducted, one featuring Ti3C2Tx MXene and SnO2 semiconductor layer and the other with SnO2 only. Notably, the TFT with the Ti3C2Tx MXene layer has shown a significant boost in the carrier mobility (10.6 cm2/V s), leading to remarkable improvements in the on/off ratio (1.3 × 105) and subthreshold swing (194 mV/decade), whereas the SnO2 TFT without the Ti3C2Tx MXene layer shows a mobility of 1.17 cm2/V s with 8.1 × 102 on/off ratio and 387 mV/decade subthreshold swing. This investigation provides a possible way toward the development of high-performance, low-voltage TFT fabrication with the MXene/semiconductor combination.

Non-Volatile Memory Based on ZnO Thin-Film Transistor with Self-Assembled Au Nanocrystals.

Non-volatile memory based on thin-film transistor is crucial for system-on-panel and flexible electronic systems. Achieving high-performance and reliable thin-film transistor (TFT) memory still remains challenging. Here, for the first time, we present a ZnO TFT memory utilizing self-assembled Au nanocrystals with a low thermal budget, exhibiting excellent memory performance, including a program/erase window of 9.8 V, 29% charge loss extrapolated to 10 years, and remarkable endurance characteristics. Moreover, the memory exhibits favorable on-state characteristics with mobility, subthreshold swing, and current on-off ratio of 17.6 cm2V-1s-1, 0.71 V/dec, and 107, respectively. Our study shows that the fabricated TFT memory has great potential for practical applications.

A high-performance organic thin-film transistor with Parylene/PMMA bilayer insulation based on P3HT

This work introduces a pioneering approach in the development of organic thin-film transistors (OTFTs),featuring a double-layer dielectric structure that combines poly(para-xylylene)s (Parylene) and poly(methyl methacrylate) (PMMA) to leverage the high insulation properties and high surface polarity of Parylene with the low insulation properties and low surface polarity of PMMA. This combination results in devices that showcase significantly enhanced electrical performance, including superior charge carrier mobility, increased current on/off ratios, and greater transconductance. Utilizing poly(3-hexylthiophene) (P3HT) for the active layer, the study demonstrates the advantage of the dual dielectric layers in minimizing hysteresis in the transfer curve, thereby facilitating the systematic growth of the organic active layer and enhancing electrical conductivity over single-layer alternatives. The superior performance of the Parylene/PMMA double-layer insulating structure opens new avenues for the advancement of organic electronics, presenting methodologies for performance optimization and expanding the application spectrum of OTFTs.

High-performance ultrathin solution-processed SnO2 top-gate thin-film transistors by constructing high-quality dielectric/channel interface

In this work, we developed a low-thermal-budget approach to realize high-performance solution-processed oxide thin-film transistors (TFTs). To construct high-quality dielectric/channel interface, the corrosion-resistant SnO2 channel and further O2 plasma pre-treatment were adopted to minimize the problematic interface defects. With this strategy, the afforded solution-processed SnO2 TFTs exhibited improved electrical performance and stability, including a descent field-effect mobility (μFE) of 21.4 cm2/V·s, high on/off ratio (Ion/Ioff) of 109, positive threshold voltage (Vth) of 0.39 V, steep SS of 94.7 mV/dec, and small ΔVth of 0.08 and −0.03 V under PBS and NBS, respectively. This work demonstrates a promising fabrication approach for solution-processed oxide TFTs towards advanced applications.

Selenium-alloyed tellurium oxide for amorphous p-channel transistors.

Compared to polycrystalline semiconductors, amorphous semiconductors offer inherent cost-effective, simple and uniform manufacturing. Traditional amorphous hydrogenated Si falls short in electrical properties, necessitating the exploration of new materials. The creation of high-mobility amorphous n-type metal oxides, such as a-InGaZnO (ref. 1), and their integration into thin-film transistors (TFTs) have propelled advancements in modern large-area electronics and new-generation displays2-8. However, finding comparable p-type counterparts poses notable challenges, impeding the progress of complementary metal-oxide-semiconductor technology and integrated circuits9-11. Here we introduce a pioneering design strategy for amorphous p-type semiconductors, incorporating high-mobility tellurium within an amorphous tellurium suboxide matrix, and demonstrate its use in high-performance, stable p-channel TFTs and complementary circuits. Theoretical analysis unveils a delocalized valence band from tellurium 5p bands with shallow acceptor states, enabling excess hole doping and transport. Selenium alloying suppresses hole concentrations and facilitates the p-orbital connectivity, realizing high-performance p-channel TFTs with an average field-effect hole mobility of around 15 cm2 V-1 s-1 and on/off current ratios of 106-107, along with wafer-scale uniformity and long-term stabilities under bias stress and ambient ageing. This study represents a crucial stride towards establishing commercially viable amorphous p-channel TFT technology and complementary electronics in a low-cost and industry-compatible manner.

High-performance nano-scale InSnO transistors

Nanoscale short-channel oxide thin film transistors (TFTs) have attracted widespread research interest due to their potential applications in advanced display and memory devices. In this work, we fabricate 10 μm channel length indium-tin-oxide (ITO) TFTs and analyze the uniformity and repeatability of ITO TFTs at the long channel range. Then we fabricate ITO TFTs with a series of channel lengths ranging from 10 μm to 150 nm and through an optimized process we finally fabricate 130 nm channel length high-performance ITO TFTs with an on-state current of 93 (μA/μm), a subthreshold swing of 102 (mV decade–1), and on/off ratio over 107 at a drain voltage of 3 V.

All-Solution-Processed High-Performance MoS2 Thin-Film Transistors with a Quasi-2D Perovskite Oxide Dielectric.

Assembling solution-processed van der Waals (vdW) materials into thin films holds great promise for constructing large-scale, high-performance thin-film electronics, especially at low temperatures. While transition metal dichalcogenide thin films assembled in solution have shown potential as channel materials, fully solution-processed vdW electronics have not been achieved due to the absence of suitable dielectric materials and high-temperature processing. In this work, we report on all-solution-processedvdW thin-film transistors (TFTs) comprising molybdenum disulfides (MoS2) as the channel and Dion-Jacobson-phase perovskite oxides as the high-permittivity dielectric. The constituent layers are prepared as colloidal solutions through electrochemical exfoliation of bulk crystals, followed by sequential assembly into a semiconductor/dielectric heterostructure for TFT construction. Notably, all fabrication processes are carried out at temperatures below 250 °C. The fabricated MoS2 TFTs exhibit excellent device characteristics, including high mobility (>10 cm2 V-1 s-1) and an on/off ratio exceeding 106. Additionally, the use of a high-k dielectric allows for operation at low voltage (∼5 V) and leakage current (∼10-11 A), enabling low power consumption. Our demonstration of the low-temperature fabrication of high-performance TFTs presents a cost-effective and scalable approach for heterointegrated thin-film electronics.

Low voltage-driven, high-performance TiO2 thin film transistors with MHz switching speed.

High-speed circuits based on thin film transistors (TFTs) show promising potential applications in biomedical imaging and human-machine interactions. One of the critical requirements for high-speed electronic devices lies in high-frequency switching or amplification at low voltages, typically driven by batteries (∼3.0 V). To date, however, most electrical performances of metal oxide TFTs are measured under direct current (DC) conditions, and their dynamic switching behaviour is scarcely explored and studied systematically. Here in this work, we present low voltage-driven, high-performance TiO2 thin film transistors, which can be operated at a switching speed of MHz. Our proposed TiO2 TFTs demonstrated a high on-off ratio of 107, together with a subthreshold swing (SS) of ∼150 mV Dec-1 averaged over four orders of magnitude, which can be further reduced below 100 mV Dec-1 when the temperature cools to 77 K. Additionally, the TiO2 TFTs exhibit excellent gate-pulse switching at various frequencies ranging from 1.0 Hz to 1.0 MHz. We also explored the potential application of the TiO2 TFTs as logic gates by constructing a resistive-loaded inverter, which shows stable operation at 10 kHz frequency and various temperatures. Thus, our results show the great potential of TiO2 TFTs as a new platform for high-speed electronic applications.

A Novel Strategy to Achieve High-Performance Titanium-Doped InZnO Thin-Film Transistors Using Atomic Layer Deposition

A Novel Strategy to Achieve High-Performance Titanium-Doped InZnO Thin-Film Transistors Using Atomic Layer Deposition

High-performance organic thin-film transistors: principles and strategies

Organic thin film transistors (OTFTs) mark a breakthrough in flexible electronics, offering advantages over traditional inorganic semiconductors through their adaptability, cost efficiency, and low-temperature production.