The influence of non-radiative recombination on the photoluminescence decay time (τPL) has been studied for GaInNAs/GaAs quantum wells with Ga- and In-rich environments of N atoms. At low temperatures, this influence is suppressed, due to the carrier localization phenomenon, which leads to a spectral dispersion of τPL. For investigated samples, this dispersion has been found to be in the range of ~0.2–2.0 ns. With the temperature increase, the free exciton emission starts to dominate instead of the localized exciton emission and the dispersion of τPL disappears. The dynamic of free exciton recombination is strongly influenced by the non-radiative recombination, which varies between samples, due to different concentration of non-radiative centers. The study of influence of non-radiative recombination on τPL has been performed at 180 K, since this temperature is high enough to eliminate the localized emission and activate non-radiative recombination and low enough to observe excitonic emission without strong contribution of free carrier recombination when the sample is excited with low power. It was observed that, for as-grown samples, the τPL increases from 0.14 to 0.25 ns with the change in As/III beam equivalent pressure ratio from 3.8 to 12.1 (in this case, it corresponds to the change in nitrogen nearest-neighbor environment from Ga- to In-rich), whereas, after annealing (i.e., also the change from Ga-rich to In-rich environment of N atoms), this time increases 2–4 times, depending on the As/III ratio. It has been concluded that the τPL is influenced by point defects rather than the nitrogen nearest-neighbor environment, but their concentration is correlated with the type of nitrogen environment.
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