The surfactant effects of antimony enhances the carbon (C) dopant incorporation into substitutional sites in GaAsSb:C grown by solid source molecular beam epitaxy. A hole mobility greater than 50 cm 2/V s for doping levels over 9×10 19 cm −3 was achieved using a solid CBr 4 source. 5.4×10 −8 Torr of carbon flux giving a hole concentration of ∼7×10 19 cm −3 in GaAs, reaches beyond 9×10 19 cm −3 with the addition of ∼4×10 −8 Torr of Sb. With increasing Sb doping concentration, the rate of C incorporation into substitutional sites increases, the photoluminescence characteristics are improved and the net hole concentration increases due to the reduction of interstitial carbon. However when Sb doping is increased further, gallium vacancies and Ga Sb antisites could create point defects, causing epitaxial degradation.