Formation Of Conductive Filaments Research Articles

Optimizing molybdenum oxide based RRAM with vacuum rapid thermal annealing and carbon quantum dots

The performance of resistive random access memory (RRAM) is significantly influenced by the dielectric layer and interface. In this study, the vacuum rapid thermal annealing (VacRTA) process and the incorporation of carbon quantum dots (CQDs) were employed to enhance the device performance. The VacRTA process induced extra oxygen vacancies in the MoOx film, reducing the energy required for the formation of Ag conductive filaments (CFs). In addition, CQDs were spin-coated on the bottom electrode (BE) interface to effectively fix the position of Ag CFs formation and rupture. The improved device exhibits remarkable performance enhancements compared to the pristine device, including a centralized distribution of resistance states and operating voltages, extended endurance cycles (1 × 107), enhanced cell-to-cell coherence, and favorable neural synaptic properties. These results demonstrate the potential of CQDs incorporated MoOx based RRAM for next generation non-volatile memory and neural synapse simulation.

Synthesis of composite films for ZnO-based memristors with superior stability

Memristors have unique non-volatile characteristics that potentially can emulate biological synapses for applications in neural computing systems. However, the random formation of conductive filaments in these devices can cause various unreliability problems. In this work, films of a composite of ZnO nanoparticles and carbon nanotubes were prepared as functional layers for memristors by an in-situ growing strategy (ZnO@CNT-IS) using a straightforward high-temperature annealing treatment. This approach allowed for the formation of a high-quality films with uniform loading of ZnO nanoparticles on the carbon nanotubes, which contributed to a lower formation energy for oxygen vacancies and increased electron transfer rate. As a result, the memristors exhibited faster switching response speed, lower power consumption, and a stabilised switching ratio even after 2000 switching cycles. Based on the analog switching behaviour, the ZnO@CNT-IS-based devices showed significant biological synapse functions and plasticity, indicating their potential for high-density storage and neuromorphic computing.

Ab initio study of oxygen vacancy filament formation at Ta/HfO2 interface

The resistive switching (RS) behavior of resistive random access memory (RRAM) based on oxygen vacancy (VO) conduction is significantly affected by the interface properties between metal electrode and oxide layer, yet the modulation between the RS behavior and the physico-chemical properties of the interface is still not very clear. In this study, the correlative role of Ta/HfO2 interface with the RS behavior in HfO2-based RRAM is explored at atomic level. First-principles thermodynamic calculations show that the strong interaction between three-fold oxygen vacancies (VO3) leads to a formation of VO3-based conductive filament (CF) along direction perpendicular to the interface. Four-fold oxygen vacancies (VO4) make a major contribution to the re-formation and growth of CFs during the set process by diffusing into the residual filaments. The results of electronic properties further indicate that as the number of VOs perpendicular to the interface increases, the charge redistribution between O and Ta atoms at the interface is significantly increased, and more electron clouds are gathered around VOs. This is the underlying mechanism of forming a conductive channel. This study reveals the important regulation mechanism of the interface characteristics between metal electrode and oxide layer in RRAM on the formation and growth of VO-based CFs.

Atomic layer annealing for spatial tailoring in sub-4 nm AlN RRAM devices with low-voltage operation

This article investigates the spatial tailoring of nitrogen vacancies by atomic layer annealing (ALA) on resistive random access memory (RRAM) devices with an AlN resistive switching layer. The ALA technique involves the in-situ layer-by-layer He/Ar plasma treatment in the cycle of atomic layer deposition for AlN. The AlN RRAM devices prepared with the ALA treatment near the TiN electrode have significantly superior uniformity of the operation voltages and the switching resistances, along with a lower cycle-to-cycle variation in endurance. This enhancement could be attributed to the relatively stable location of rupture and formation of conductive filaments, as a result of the film densification and the suppression of nitrogen vacancies in the AlN region treated with the ALA process. The AlN RRAM devices also demonstrate excellent retention of more than 106 seconds at 125°C. In addition, the ultra-thin 3.3 nm AlN switching layer contributes to low operation voltages of AlN RRAM. The outcomes manifest that the ALA technique could effectively improve the properties of nanoscale materials through precise spatial tailoring, with an accuracy up to atomic scale.

Formation-free resistive switching in nanocrystalline tellurium oxide

In this work, we report on the observation of resistive switching (RS) in the nanocrystalline tellurium oxide (TeO x ) in ITO/TeO x /Ag device configuration. The TeO x films grown in an O2/Ar environment have dominant β-TeO2 along with other polymorphs and amorphous TeO2. From the RS characteristics, it is suggestive that the β-TeO2 phase promotes the conductive filament formation across the highly insulating amorphous matrix. The memory device demonstrates bipolar RS with excellent endurance, retention and on–off ratio. The device also features formation-free switching with low set and reset voltage (0.6 V and −0.8 V respectively) and displays multilevel switching upon varying compliance current. Current-Voltage characterization clarifies the conduction path is indeed filamentary type. The result highlights that TeO x can be a prominent RS material for memory and brain-inspired computing devices.

Vacancy-Engineered Nickel Ferrite Forming-Free Low-Voltage Resistive Switches for Neuromorphic Circuits.

Innovations in resistive switching devices constitute a core objective for the development of ultralow-power computing devices. Forming-free resistive switching is a type of resistive switching that eliminates the need for an initial high voltage for the formation of conductive filaments and offers promising opportunities to overcome the limitations of traditional resistive switching devices. Here, we demonstrate mixed charge state oxygen vacancy-engineered electroforming-free resistive switching in NiFe2O4 (NFO) thin films, fabricated as asymmetric Ti/NFO/Pt heterostructures, for the first time. Using pulsed laser deposition in a controlled oxygen atmosphere, we tune the oxygen vacancies together with the cationic valence state in the nickel ferrite phase, with the latter directly affecting the charge state of the oxygen vacancies. The structural integrity and chemical composition of the films are confirmed by X-ray diffraction and hard X-ray photoelectron spectroscopy, respectively. Electrical transport studies reveal that resistive switching characteristics in the films can be significantly altered by tuning the amount and charge state of the oxygen vacancy concentration during the deposition of the films. The resistive switching mechanism is seen to depend upon the migration of both singly and doubly charged oxygen vacancies formed as a result of changes in the nickel valence state and the consequent formation/rupture of conducting filaments in the switching layer. This is supported by the existence of an optimum oxygen vacancy concentration for efficient low-voltage resistive switching, below or above which the switching process is inhibited. Along with the filamentary switching mechanism, the Ti top electrode also enhances the resistive switching performance due to interfacial effects. Time-resolved measurements on the devices display both long- and short-term potentiation in the optimized vacancy-engineered NFO resistive switches, ideal for solid-state synapses achieved in a single system. Our work on correlated oxide forming-free resistive switches holds significant potential for CMOS-compatible low-power, nonvolatile resistive memory and neuromorphic circuits.

Atomic-scale oxygen-vacancy engineering in Sub-2 nm thin Al2O3/MgO memristors

Ultrathin (sub-2 nm) Al2O3/MgO memristors were recently developed using an in vacuo atomic layer deposition (ALD) process that minimizes unintended defects and prevents undesirable leakage current. These memristors provide a unique platform that allows oxygen vacancies (VO) to be inserted into the memristor with atomic precision and study how this affects the formation and rupture of conductive filaments (CFs) during memristive switching. Herein, we present a systematic study on three sets of ultrathin Al2O3/MgO memristors with VO-doping via modular MgO atomic layer insertion into an otherwise pristine insulating Al2O3 atomic layer stack (ALS) using an in vacuo ALD. At a fixed memristor thickness of 17 Al2O3/MgO atomic layers (∼1.9 nm), the properties of the memristors were found to be affected by the number and stacking pattern of the MgO atomic layers in the Al2O3/MgO ALS. Importantly, the trend of reduced low-state resistance and the increasing appearance of multi-step switches with an increasing number of MgO atomic layers suggests a direct correlation between the dimension and dynamic evolution of the conducting filaments and the VO concentration and distribution. Understanding such a correlation is critical to an atomic-scale control of the switching behavior of ultrathin memristors.

Investigation on the mechanism and a universal structural design method for resistive switching devices

Resistive random-access memories have attracted significant attention in memory applications, while the physical mechanism behind their resistive switching behavior is still unclear. As a key issue, the migration of oxygen vacancies (VO) directly influences the performance of devices in the formation and rupture of conductive filaments (CFs). In this work, the distance of VO migration is performed as electric field dependent and affects the performance of the device. Sufficient distance of VO migration is essential for formation and rupture of CF completely, leading to, ideally, SET/RESET transition of the device. Based on this mechanism, an enhanced electric field is designed that optimizes the stability of the device significantly, which is demonstrated to be a promising approach to optimize the properties of the device. The investigation is helpful for guiding the design of device structures.

Low-power, linear, and uniform bimodal resistive switching in proton conducting/insulating bilayer-based memristor

The emergence of artificial intelligence (AI) has recently necessitated the processing of big data. However, a separation between the memory and processing unit leads to significant time and power waste in conventional computing architecture. Therefore, memristors have been spotlighted due to their ability to store and process information at once with simple structures. However, conductive filament formation due to random ion movement induces stochastic resistive switching and nonlinear conductance modulation. In this study, we demonstrate a proton-electron coupled memristor controlled either by humidity or voltage using a tyrosine-rich peptide/Al2O3 bilayer to mitigate those bottlenecks. Introducing the proton insulating layer into a peptide memristor device significantly enhanced electrical performance in terms of linear weight update, uniform resistive switching, and low power consumption. The interlayered memristor device exhibited computing voltage reduction of 56%, two orders of magnitude increased switching window, and linearity and uniformity improvement by 36% and 85%, respectively. Consequently, the image recognition simulation showed a 20% accuracy improvement. These improvements are elucidated by filament confinement effect from the switching medium shift due to input mode. Therefore, these results not only provide a material-level strategy for high-performance memristors but also demonstrate bimodally controllable memristors for biomimetic electronics.

Effect of Electrochemically Active Top Electrode Materials on Nanoionic Conductive Bridge Y2O3 Random-Access Memory.

Herein, sol-gel-processed Y2O3 resistive random-access memory (RRAM) devices were fabricated. The top electrodes (TEs), such as Ag or Cu, affect the electrical characteristics of the Y2O3 RRAM devices. The oxidation process, mobile ion migration speed, and reduction process all impact the conductive filament formation of the indium-tin-oxide (ITO)/Y2O3/Ag and ITO/Y2O3/Cu RRAM devices. Between Ag and Cu, Cu can easily be oxidized due to its standard redox potential values. However, the conductive filament is easily formed using Ag TEs. After triggering the oxidation process, the formed Ag mobile metal ions can migrate faster inside Y2O3 active channel materials when compared to the formed Cu mobile metal ions. The fast migration inside the Y2O3 active channel materials successfully reduces the SET voltage and improves the number of programming-erasing cycles, i.e., endurance, which is one of the nonvolatile memory parameters. These results elucidate the importance of the electrochemical properties of TEs, providing a deeper understanding of how these factors influence the resistive switching characteristics of metal oxide-based atomic switches and conductive-metal-bridge-filament-based cells.

Synergistically Modulating Conductive Filaments in Ion-Based Memristors for Enhanced Analog In-Memory Computing.

Memristors offer a promising solution to address the performance and energy challenges faced by conventional von Neumann computer systems. Yet, stochastic ion migration in conductive filament often leads to an undesired performance tradeoff between memory window, retention, and endurance. Herein, a robust memristor based on oxygen-rich SnO2 nanoflowers switching medium, enabled by seed-mediated wet chemistry, to overcome the ion migration issue for enhanced analog in-memory computing is reported. Notably, the interplay between the oxygen vacancy (Vo) and Ag ions (Ag+) in the Ag/SnO2/p++-Si memristor can efficiently modulate the formation and abruption of conductive filaments, thereby resulting in a high on/off ratio (>106), long memory retention (10-year extrapolation), and low switching variability (SV = 6.85%). Multiple synaptic functions, such as paired-pulse facilitation, long-term potentiation/depression, and spike-time dependent plasticity, are demonstrated. Finally, facilitated by the symmetric analog weight updating and multiple conductance states, a high image recognition accuracy of ≥ 91.39% is achieved, substantiating its feasibility for analog in-memory computing. This study highlights the significance of synergistically modulating conductive filaments in optimizing performance trade-offs, balancing memory window, retention, and endurance, which demonstrates techniques for regulating ion migration, rendering them a promising approach for enabling cutting-edge neuromorphic applications.

Ce-doping at Mn site to enhance resistive switching performance of spinel MnCo2O4 resistive random access memory devices

The spinel Ce-doping MnCo2O4 (MCO) thin films were fabricated on Pt/Ti/SiO2/Si substrates for resistive switching (RS) layer using sol-gel spin-coating deposition method. The Pt/Mn0.925Ce0.075Co2O4/Pt (Pt/7.5MCC/Pt) device exhibits stabler and superior bipolar RS performance, the concentrated distribution of Reset/Set voltage as low as – 0.62/1.175 V, good cycle endurance and excellent time retention capability. The improvement in the RS performance of the Pt/7.5MCC/Pt devices can be attributable to the effective limitation of the random formation and rupture of conductive filaments by appropriate Ce doping. The carrier transport mechanism of the device at high resistance state can be dominated by the Schottky emission, whereas the carrier transport mechanism at low resistance state consistent with the Ohmic conduction. This work provides a potential performance improvement approach to design the resistive memory devices for data storage applications.

Coexistence of analog and digital memristive behaviors in MoO3 based devices for artificial synaptic and logic display applications

In-memory logic operations and neuromorphic computing inspired by the brain based on memristors are promising computing modes that can improve computational efficiency and avoid additional power consumption. However, implementing these two functions within the memristor same cell is often limited by the flexible conversion between digital and analog memristive behaviors. In this work, a memristive device with Ag/MoO3/Ti structure was developed using hydrothermal methods, which presents the evolution from capacitance-coupled memristive effect to self-rectifying non-zero crossing analog memristive behavior and then to digital memristive effect by adjusting the amplitude of applied voltage. Under low voltage region (Vamplitude ≤ 1.2 V), the non-zero crossing analog memristive effect with self-rectifying behavior is mainly attributed to the potential barrier at the interface and built-in electric field, while the digital memristive effect under high voltage region (Vamplitude ≥ 1.5 V) is mainly attributed to the formation and fracture of Ag conductive filaments (CFs). Moreover, the mechanism for the non-zero-crossing characteristic of device was proven by parallel connection of memristors and capacitors. Finally, the artificial synaptic and logic display functions were implemented using the as-prepared memristive unit. Therefore, this work provided guidance for understanding the non-zero-crossing memristive effect and the development of high-density multifunctional devices.

Improved resistive switching characteristics of solution processed ZrO2/SnO2 bilayer RRAM via oxygen vacancy differential

In this study, a solution-processed bilayer structure ZrO2/SnO2 resistive switching (RS) random access memory (RRAM) is presented for the first time. The precursors of SnO2 and ZrO2 are Tin(Ⅱ) acetylacetonate (Sn(AcAc)2) and zirconium acetylacetonate (Zr(C5H7O2)4), respectively. The top electrode was deposited with Ti using an E-beam evaporator, and the bottom electrode used an indium–tin–oxide glass wafer. We created three devices: SnO2 single-layer, ZrO2 single-layer, and ZrO2/SnO2 bilayer devices, to compare RS characteristics such as the I–V curve and endurance properties. The SnO2 and ZrO2 single-layer devices showed on/off ratios of approximately 2 and 51, respectively, along with endurance switching cycles exceeding 50 and 100 DC cycles. The bilayer device attained stable RS characteristics over 120 DC endurance switching cycles and increased on/off ratio ∼2.97 × 102. Additionally, the ZrO2/SnO2 bilayer bipolar switching mechanism was explained by considering the Gibbs free energy (ΔG o) difference in the ZrO2 and SnO2 layers, where the formation and rupture of conductive filaments were caused by oxygen vacancies. The disparity in the concentration of oxygen vacancies, as indicated by the Gibbs free energy difference between ZrO2 (ΔG o = −1100 kJ mol−1) and SnO2 (ΔG o = −842.91 kJ mol−1) implied that ZrO2 exhibited a higher abundance of oxygen vacancies compared to SnO2, resulting in improved endurance and on/off ratio. X-ray photoelectron spectroscopy analyzed oxygen vacancies in ZrO2 and SnO2 thin films. The resistance switching characteristics were improved due to the bilayer structure, which combines a higher oxygen vacancy concentration in one layer with a lower oxygen vacancy concentration in the switching layer. This configuration reduces the escape of oxygen vacancies to the electrode during RS.

In Situ Unveiling of the Resistive Switching Mechanism of Halide Perovskite-Based Memristors.

The organic-inorganic halide perovskite has become one of the most promising candidates for next-generation memory devices, i.e. memristors, with excellent performance and solution-processable preparation. Yet, the mechanism of resistive switching in perovskite-based memristors remains ambiguous due to a lack of in situ visualized characterization methods. Here, we directly observe the switching process of perovskite memristors with in situ photoluminescence (PL) imaging microscopy under an external electric field. Furthermore, the corresponding element composition of conductive filaments (CFs) is studied, indicating that the metallic CFs with respect to the activity of the top electrode are essential for device performance. Finally, electrochemical impedance spectroscopy (EIS) is conducted to reveal that the transition of ion states is associated with the formation of metallic CFs. This study provides in-depth insights into the switching mechanism of perovskite memristors, paving a pathway to develop and optimize high-performance perovskite memristors for large-scale applications.

Performance analysis and prediction of tunable metasurface filter based on electrochemical metallization

In this paper, a tunable metasurface filter based on electrochemical metallization is proposed. The finite element method is used to simulate the formation and rupture of the conductive filament (CF). The geometric structure of the metasurfaces filter is reconstructed by CF to achieve the purpose of tuning the transmission characteristics of the metasurface. Due to the formation of CF in the gap of separated rectangular gold patches, the proposed metasurface simultaneously exhibits the resonance characteristics of two separated rectangular gold patches and unseparated rectangular gold patches. Numerical calculations show that when the radius of the CF increases from 5 nm to 25 nm, the metasurface shows good tunable filtering characteristics, and its quality factor gradually increases. Finally, in order to solve the problem of consuming a lot of time to design metasurface, a deep neural network is used to predict the transmission curves corresponding to different metasurface structures. The results show that the mean square error of the training model is less than 1 × 10−3, which shows superior robustness and generalization, and greatly shortens the time required for design. This design paves a new way to develop optoelectronic devices, such as modulators, sensors and optical switches.

Highly Reliable Performance of Flexible Synaptic Devices Based on PVP-GO QD Nanocomposites Due to the Formation of Directional Filaments.

The metallic conductive filament (CF) model, which serves as an important conduction mechanism for realizing synaptic functions in electronic devices, has gained recognition and is the subject of extensive research. However, the formation of CFs within the active layer is plagued by issues such as uncontrolled and random growth, which severely impacts the stability of the devices. Therefore, controlling the growth of CFs and improving the performance of the devices have become the focus of that research. Herein, a synaptic device based on polyvinylpyrrolidone (PVP)/graphene oxide quantum dot (GO QD) nanocomposites is proposed. Doping GO QDs in the PVP provides a large number of active centers for the reduction of silver ions, which allows, to a certain extent, the growth of CFs to be controlled. Because of this, the proposed device can simulate a variety of synaptic functions, including the transition from long-term potentiation to long-term depression, paired-pulse facilitation, post-tetanic potentiation, transition from short-term memory to long-term memory, and the behavior of the "learning experience". Furthermore, after being bent repeatedly, the devices were still able to simulate multiple synaptic functions accurately. Finally, the devices achieved a high recognition accuracy rate of 89.39% in the learning and inference tests, producing clear digit classification results.

Resistive switching in benzylammonium-based Ruddlesden-Popper layered hybrid perovskites for non-volatile memory and neuromorphic computing.

Artificial synapses based on resistive switching have emerged as a promising avenue for brain-inspired computing. Hybrid metal halide perovskites have provided the opportunity to simplify resistive switching device architectures due to their mixed electronic-ionic conduction, yet the instabilities under operating conditions compromise their reliability. We demonstrate reliable resistive switching and synaptic behaviour in layered benzylammonium (BzA) based halide perovskites of (BzA)2PbX4 composition (X = Br, I), showing a transformation of the resistive switching from digital to analog with the change of the halide anion. While (BzA)2PbI4 devices demonstrate gradual set and reset processes with reduced power consumption, the (BzA)2PbBr4 system features a more abrupt switching behaviour. Moreover, the iodide-based system displays excellent retention and endurance, whereas bromide-based devices achieve a superior on/off ratio. The underlying mechanism is attributed to the migration of halide ions and the formation of halide vacancy conductive filaments. As a result, the corresponding devices emulate synaptic characteristics, demonstrating the potential for neuromorphic computing. Such resistive switching and synaptic behaviour highlight (BzA)2PbX4 perovskites as promising candidates for non-volatile memory and neuromorphic computing.

Electrochemical rewiring through quantum conductance effects in single metallic memristive nanowires.

Memristive devices have been demonstrated to exhibit quantum conductance effects at room temperature. In these devices, a detailed understanding of the relationship between electrochemical processes and ionic dynamic underlying the formation of atomic-sized conductive filaments and corresponding electronic transport properties in the quantum regime still represents a challenge. In this work, we report on quantum conductance effects in single memristive Ag nanowires (NWs) through a combined experimental and simulation approach that combines advanced classical molecular dynamics (MD) algorithms and quantum transport simulations (DFT). This approach provides new insights on quantum conductance effects in memristive devices by unravelling the intrinsic relationship between electronic transport and atomic dynamic reconfiguration of the nanofilment, by shedding light on deviations from integer multiples of the fundamental quantum of conductance depending on peculiar dynamic trajectories of nanofilament reconfiguration and on conductance fluctuations relying on atomic rearrangement due to thermal fluctuations.

Direct visualization and 3D reconstruction of conductive filaments in aSiO2 material-based memristive device.

Observation of conductive filaments has greatly aided the development of theoretical models of memristive devices. In this work, we visualized and reconstructed the conductive filaments in a Cu/Cu-doped SiO2/W device employing a focused ion beam (FIB) as a milling technique. The SEM images taken from the device after 150 DC sweep cycles showed that Joule heat played a vital role in determining the morphology of a conductive filament, where the vaporization of the conductive filament resulted in the creation of defects, including particles, voids, and cavities. The competition between the formation and vaporization of conductive filaments generally induces a remarkable current fluctuation. Since Cu-doped SiO2 was utilized as the electrolyte, the vapors exfoliated adjacent single layers. FIB milling proceeded in top-down and front-back modes; thus, a 3D model of conductive filaments and defects was constructed according to a series of FIB-SEM images. This methodology is promising for a future failure analysis of memristive devices.