Ferroelectric Layer Research Articles

A 2D ferroelectric vortex pattern in twisted BaTiO3 freestanding layers

The wealth of complex polar topologies1–10 recently found in nanoscale ferroelectrics results from a delicate balance between the intrinsic tendency of the materials to develop a homogeneous polarization and the electric and mechanical boundary conditions imposed on them. Ferroelectric–dielectric interfaces are model systems in which polarization curling originates from open circuit-like electric boundary conditions, to avoid the build-up of polarization charges through the formation of flux-closure11–14 domains that evolve into vortex-like structures at the nanoscale15–17 level. Although ferroelectricity is known to couple strongly with strain (both homogeneous18 and inhomogeneous19,20), the effect of mechanical constraints21 on thin-film nanoscale ferroelectrics has been comparatively less explored because of the relative paucity of strain patterns that can be implemented experimentally. Here we show that the stacking of freestanding ferroelectric perovskite layers with controlled twist angles provides an opportunity to tailor these topological nanostructures in a way determined by the lateral strain modulation associated with the twisting. Furthermore, we find that a peculiar pattern of polarization vortices and antivortices emerges from the flexoelectric coupling of polarization to strain gradients. This finding provides opportunities to create two-dimensional high-density vortex crystals that would enable us to explore previously unknown physical effects and functionalities.

Impact of deposition temperature on electrical properties of HZO-based FeRAM

This study presents a comprehensive investigation of the impact of the deposition temperature on the HfxZr1−xO2 (HZO) ferroelectric layer of ferroelectric random access memory with TaN electrodes. This investigation mainly focuses on its electrical characteristics and compares the differences. It is revealed that the deposition temperature plays a crucial role in determining the crystal structure of HZO, which can exhibit a combination of tetragonal and orthorhombic phases or exist solely in one of the two phases. Furthermore, the grain size of HZO varies with the deposition temperature. These findings correspond well to the electrical measurement results, including leakage current, polarization, capacitance, and reliability tests. The study tracks the phase transition process during the operation of switching cycles when the phase transition process can be monitored as well. To better understand the observed differences, physical models that shed light on the underlying mechanisms affected by deposition temperature are proposed at the end of the article.

Nonvolatile Multistate Manipulation of Topological Magnetism in Monolayer CrI3 through Quadruple-Well Ferroelectric Materials.

Nonvolatile multistate manipulation of two-dimensional (2D) magnetic materials holds promise for low dissipation, highly integrated, and versatile spintronic devices. Here, utilizing density functional theory calculations and Monte Carlo simulations, we report the realization of nonvolatile and multistate control of topological magnetism in monolayer CrI3 by constructing multiferroic heterojunctions with quadruple-well ferroelectric (FE) materials. The Pt2Sn2Te6/CrI3 heterojunction exhibits multiple magnetic phases upon modulating FE polarization states of FE layers and interlayer sliding. These magnetic phases include Bloch-type skyrmions and ferromagnetism, as well as a newly discovered topological magnetic structure. We reveal that the Dzyaloshinskii-Moriya interaction (DMI) induced by interfacial coupling plays a crucial role in magnetic skyrmion manipulation, which aligns with the Fert-Levy mechanism. Moreover, a regular magnetic skyrmion lattice survives when removing a magnetic field, demonstrating its robustness. The work sheds light on an effective approach to nonvolatile and multistate control of 2D magnetic materials.

A proof of concept for reliability aware analysis of junctionless negative capacitance FinFET-based hydrogen sensor

This work demonstrates the reliability-aware analysis of the Junctionless negative capacitance (NC) FinFET employed as a hydrogen (H2) gas sensor. Gate stacking of the ferroelectric (FE) layer induces internal voltage amplification owing to the NC property, thus, improving the sensitivity of the baseline junctionless FinFET. A well-calibrated TCAD model is used to investigate the sensing characteristics of the proposed FinFET-based H2 sensor by employing the palladium (Pd) metallic gate as a sensing element. The mechanism involves the transduction of H2 gas molecules over the metal gate; due to the diffusion process, some atomic hydrogen diffuses into the metal. The H2 gas absorption at the metal surface causes a dipole layer formation at the gate and oxide interface, which changes the metal gate work function. As a result, this change in the work function can be used as a sensing parameter of the proposed gas sensor. Further, the threshold voltage and other electrical characteristics, such as output conductance, transconductance, and drain current are examined for sensitivity analysis for both NC and without NC JL FinFET at different pressure ranges, keeping the temperature constant (i.e. 300 K). The device variation, i.e. Fin thickness, Fin height, doping and thickness of HfO2 ferroelectric layer, etc, on sensor sensitivity has been evaluated through extensive simulation. This paper also presents a detailed investigation of the sensor’s reliability in terms of work function variation, random dopant fluctuation, trap charges, and device aging, i.e. end of a lifetime. At last, the acquired results are compared with earlier reported data, which justifies the profound significance of the proposed junctionless negative capacitance FinFET-based H2 gas sensor.

Texture in atomic layer deposited Hf0.5Zr0.5O2 ferroelectric thin films

HfO2-based ferroelectric materials have excellent CMOS compatibility and polarization even in ultrathin films, which is regarded as promising candidate material for memory devices and related electronic devices. However, as the ferroelectric layer thickness scaling down, the consistency of device performance is inevitably affected by the complex polyphase and polycrystalline nature of HfO2-based ferroelectric thin films. Therefore, obtaining and controlling the texture of HfO2-based ferroelectric thin films is extremely important for regulating polarization orientation and improving ferroelectric polarization. In this work, 10 nm Hf0.5Zr0.5O2 (HZO) films were prepared by atomic layer deposition (ALD) on Nb-doped SrTiO3 (NSTO) single crystal substrates. The texture and orientation of HZO films were analyzed through the state-of-the-art spherical aberration corrected transmission electron microscope (Cs-TEM) technique. The domain matching epitaxy between HZO films and NSTO substrate helps eliminate lattice mismatch and residual misfit strain, and ultimately leads to the formation of <112> texture in HZO ferroelectric films. The obtained results represent lattice and interface play an extremely important role in regulating the ferroelectricity of HfO2-based films, which provides a way to design ultra-thin HfO2-based materials with excellent ferroelectric polarization by controlling the crystal structure and orientation.

Performance comparison of planar and cylindrical ferroelectric tunnel junctions

A comprehensive comparison of the electrical characteristics between the planar (P-FTJ) and cylindrical ferroelectric tunnel junction (C-FTJ) is conducted based on physical modeling and simulation. The FTJ architecture consists of metal-ferroelectric–dielectric-metal stacks. Two configurations of C-FTJ are considered depending on whether the position of the ferroelectric (FE) layer is close or away from the inner electrode. The differences between the P-FTJ and C-FTJs in the distributions of the electric field and FE polarization are analyzed. The resultant tunneling electroresistance (TER) is explored as a function of the inner radius, FE thickness, dielectric thickness, and remnant polarization. These simulation results offer physical insights into achieving highly integrated three-dimensional storage structures by improving the TER ratio.

Giant tunnelling electroresistance in atomic-scale ferroelectric tunnel junctions

Ferroelectric tunnel junctions are promising towards high-reliability and low-power non-volatile memories and computing devices. Yet it is challenging to maintain a high tunnelling electroresistance when the ferroelectric layer is thinned down towards atomic scale because of the ferroelectric structural instability and large depolarization field. Here we report ferroelectric tunnel junctions based on samarium-substituted layered bismuth oxide, which can maintain tunnelling electroresistance of 7 × 105 with the samarium-substituted bismuth oxide film down to one nanometer, three orders of magnitude higher than previous reports with such thickness, owing to efficient barrier modulation by the large ferroelectric polarization. These ferroelectric tunnel junctions demonstrate up to 32 resistance states without any write-verify technique, high endurance (over 5 × 109), high linearity of conductance modulation, and long retention time (10 years). Furthermore, tunnelling electroresistance over 109 is achieved in ferroelectric tunnel junctions with 4.6-nanometer samarium-substituted bismuth oxide layer, which is higher than commercial flash memories. The results show high potential towards multi-level and reliable non-volatile memories.

Optimized energy storage performance in bilayer heterogeneous films

Film-based dielectric capacitors featured with small size, high breakdown field, and high energy storage density enable the application for integrated and miniatured electronic devices. So far, kinds of dielectrics have been explored for higher energy storage performance. Linear-like dielectrics can endure a high breakdown field but the polarization is too small. Conversely, ferroelectrics have high polarization but a low breakdown field, limiting their further performance optimization. Herein, we designed bilayer dielectric film capacitors that combined the linear-like dielectric layer and the ferroelectric layer, which brings in a redistribution of electric field owing to the different capacitance of each layer, thus improving the breakdown field and delaying the polarization saturation. Consequently, a high energy density of 57 J cm−3 with an efficiency of 88% was achieved. In addition, the bilayer film also exhibited excellent anti-fatigue and temperature-invariant characteristics, showing great potential for future applications in dielectric energy storage.

Phase transformation on HZO ferroelectric layer in ferroelectric random-access memory induced by x-ray irradiation

In this study, electrical measurements on ferroelectric random-access memory by prior x-ray irradiation are conducted. Compared with an unirradiated device, parameters such as current leakage and remnant polarization of the irradiated device were unexpectedly improved. Besides, better reliabilities including the number of endurance times and retention time have also been demonstrated. To clarify the underlying physical mechanism, the electrical properties are analyzed. The current–voltage curve (I–V) implies a change in the grain size in the ferroelectric layer (FL), and the capacitance–voltage curve (C–V) profile indicates that the FL undergoes a phase change during irradiation. Finally, according to the electrical results, a physical model is proposed as an explanation.

High Tunneling Electro-Resistance Due to Resonant-Type Tunneling in a Ferroelectric Tunnel Junction (FTJ) with a Composite Barrier

Recently, ferroelectric tunnel junctions (FTJs) have emerged as potential devices for memory sector wherein the tunneling current is used to sense the direction of polarization with a nondestructive reading operation. The tunneling electro-resistance ratio (TER) is the figure of merit of this device. A composite ferroelectric-dielectric barrier is expected to achieve a high TER with enhanced performance. A theoretical modeling of a FTJ with a composite barrier (CB) consisting of a dielectric (SrTiO3) and ferroelectric (BaTiO3) layers is proposed. The potential energy profile and the transmission characteristics of a typical (20Å) SrRuO3/(20Å) SrTiO3/(20Å) BaTiO3/(12Å) Pt FTJ system were extensively studied, for both OFF and ON states. The tunneling current density and TER were computed with the variation of bias as well as with varying ferroelectric layer width. Under electric bias, an asymmetric triangular well develops at the dielectric-ferroelectric interface in its ON state whose effect in producing a resonant-type tunneling and a high tunneling current density in its ON state is explained.

Low-power and high-speed HfLaO-based FE-TFTs for artificial synapse and reconfigurable logic applications.

Emulating the human nervous system to build next-generation computing architectures is considered a promising way to solve the von Neumann bottleneck. Transistors based on ferroelectric layers are strong contenders for the basic unit of artificial neural systems due to their advantages of high speed and low power consumption. In this work, the potential of Fe-TFTs integrating the HfLaO ferroelectric film and ultra-thin ITO channel for artificial synaptic devices is demonstrated for the first time. The Fe-TFTs can respond significantly to pulses as low as 14 ns with an energy consumption of 93.1 aJ, which is at the leading level for similar devices. In addition, Fe-TFTs exhibit essential synaptic functions and achieve a recognition rate of 93.2% for handwritten digits. Notably, a novel reconfigurable approach involving the combination of two types of electrical pulses to realize Boolean logic operations ("AND", "OR") within a single Fe-TFT has been introduced for the first time. The simulations of array-level operations further demonstrated the potential for parallel computing. These multifunctional Fe-TFTs reveal new hardware options for neuromorphic computing chips.

High tunneling electroresistance in ferroelectric tunnel junctions based on two-dimensional α-In2Se3/MoTe2 van der Waals heterostructures.

Ferroelectric polarization-controlled band alignment can be realized in van der Waals heterostructures (vdWHs), which can be used to create new types of ferroelectric tunnel junctions (FTJs). In this work, we design six probable configurations of two-dimensional vdWHs based on a two-dimensional α-In2Se3 ferroelectric material which has two opposite polarization states P↑ and P↓, and the semiconductor MoTe2. First-principles calculations show robust ferroelectric polarization-controlled switching behavior between the high conductance state in configuration AA-P↓ and the low conductance state in configuration AA-P↑ in the most stable AA stacked vdWHs. Based on this vdWH, a two-dimensional transverse FTJ with AA-P↓ or AA-P↑ as the tunneling barrier and (In0.5Sn0.5)2Se3 monolayers (n-type doped) as electrodes is designed. The tunneling electroresistance ratio of the FTJs at the Fermi level reaches 1.22 × 104% when the tunneling barrier contains two repeating units N = 2 and can be greatly increased by increasing the thickness of the ferroelectric layer. Analysis of the work function, charge redistribution, and local density of states is performed to interpret the above phenomena. The findings suggest the great potential of the AA stacked α-In2Se3/MoTe2 vdWH in the design of high-performance FTJs and application in high-density non-volatile memory devices.

Giant Electroresistance in Ferroelectric Tunnel Junctions via High-Throughput Designs: Toward High-Performance Neuromorphic Computing.

Ferroelectric tunnel junctions (FTJs) have been regarded as one of the most promising candidates for next-generation devices for data storage and neuromorphic computing owing to their advantages such as fast operation speed, low energy consumption, convenient 3D stack ability, etc. Here, dramatically different from the conventional engineering approaches, we have developed a tunnel barrier decoration strategy to improve the ON/OFF ratio, where the ultrathin SrTiO3 (STO) dielectric layers are periodically mounted onto the BaTiO3 (BTO) ferroelectric tunnel layer using the high-throughput technique. The inserted STO enhances the local tetragonality of the BTO, resulting in a strengthened ferroelectricity in the tunnel layer, which greatly improves the OFF state and reduces the ON state. Combined with the optimized oxygen migration, which can further manipulate the tunneling barrier, a record-high ON/OFF ratio of ∼108 has been achieved. Furthermore, utilizing these FTJ-based artificial synapses, an artificial neural network has been simulated via back-propagation algorithms, and a classification accuracy as high as 92% has been achieved. This study screens out the prominent FTJ by the high-throughput technique, advancing the tunnel layer decoration at the atomic level in the FTJ design and offering a fundamental understanding of the multimechanisms in the tunnel barrier.

Optimization Method for Conductance Modulation in Ferroelectric Transistor for Neuromorphic Computing

AbstractThe learning accuracy of neuromorphic computing that mimics the biological brain, is affected by the conductance‐modulation characteristics of an artificial synapse. In ferroelectric‐based devices, these characteristics are implemented using a distribution of polarization values. Therefore, the distribution in a ferroelectric thin film with various external voltage signals is investigate. As polarization switching proceeds with voltage pulse, the domains of the switched polarization become larger. In ferroelectric‐gate field effect transistors, the channel layer assumed to lie beneath the ferroelectrics experiences a local conductance change, according to the polarization distribution of the ferroelectric layer. It is found that small clusters with high conductivity become large clusters in the channel layer as the polarization switching proceeds. When the additional pulses are applied, the high conductive regions eventually connect (i.e., percolate) in the channel layer and the conductance of the layer is greatly increased. Adjusting the height of the applied voltage can slow down or speed up this phenomenon. Also, the nanosecond voltage pulses are employed and the width of the conductive pathway is adjusted. It enables to fine‐tune the conductance of the channel layer. It demonstrates that conductance modulation is optimized with an appropriate voltage pulse train pattern.

Using a perovskite oxide buffer layer on Ca2Nb3O10 nanosheets for the epitaxial growth of Pb(Zr0.52Ti0.48)O3 for electrode-free thin films

Ca2Nb3O10 nanosheet layers were deposited on Gallium Nitride (GaN)-on-Si substrates by the Langmuir-Blodgett method to obtain (001)-oriented growth of perovskite oxide thin films using pulsed laser deposition. We investigated the influence of 10 nm thick SrTiO3, (LaAlO3)0.3(Sr2AlTaO6)0.7 (LSAT) and LaMnO3 films as buffer layers on the structural and ferroelectric properties of subsequentially grown Pb(Zr0.52Ti0.48)O3 (PZT) films, which may be used as gate capacitors in high power GaN devices. Scanning Electron Microscopy, Atomic Force Microscopy, X-Ray-Diffraction and in-plane polarization experiments were used to determine the influence of the oxide buffer layers on the PZT properties. Highly crystalline dense (001)-oriented PZT films with large in-plane polarizations were obtained using SrTiO3 and LSAT as buffer layers. For SrTiO3 and LSAT we observed an improvement of the structural and ferroelectric properties compared to PZT grown directly on the Ca2Nb3O10 nanosheets and or using a LaMnO3 buffer layer. The improved high-crystallinity PZT films grown on GaN using ultrathin buffer layers could enhance the performance of high-power semiconductor electronics or in other devices where there is a need for a ferroelectric layer without bottom electrode.

Characterization of In‐Plane Piezoelectric Strain of Ferroelectric Thin Films by the Magnetoelectric Coupling Effect

Piezoelectric response of the ferroelectric/piezoelectric thin films is crucial for actuation of micro‐electromechanical systems (MEMS) devices as well as strain‐mediated electronic devices. Among many piezoelectric modes, longitudinal and transverse piezostrain is the most widely used. Various methods have been well established for quantitative characterization of the longitudinal piezostrain, such as laser interferometer and piezoelectric force microscopy. However, it is still a great challenge to characterize transverse piezostrain. Herein, a new method is established to characterize the transverse (in‐plane) piezostrain of ferroelectric/piezoelectric thin films by the inverse magnetoelectric (ME) coupling effect. A ferromagnetic thin film is patterned onto the ferroelectric thin film to form an artificial multiferroic heterostructure. The transverse piezostrain can transfer from the ferroelectric layer to the ferromagnetic layer and shift its ferromagnetic resonance field through the ME coupling effect. By comparing with a control sample of “bulk piezoceramic/ferromagnetic thin film” whose in‐plane piezostrain can be easily measured, the in‐plane piezostrain and piezoelectric coefficient of the ferroelectric thin films are then estimated. The in‐plane piezoelectric coefficient d31 and piezoelectric strain S31 of Pb(Zr,Ti)O3 (PZT) thin films are measured by this method. This new method will promote to fully understand the piezoelectric properties of the ferroelectric/piezoelectric thin films.

Negative Capacitance Dual-Gated ISFETs as Ultra-Sensitive pH Sensors.

Ion-sensitive field-effect transistors (ISFETs) are promising candidates for next-generation pH sensors, enabling highly sensitive and label-free biomolecular and chemical detection. Emerging FETs based on the negative capacitance (NC) effect offer steep-subthreshold switching and higher drive current simply by integrating a ferroelectric (FE) material into the gate stack. Here, we propose a novel NC dual-gated ISFET (NC-DG-ISFET)-based pH sensor, with FE layers integrated into both the top and the bottom gate stacks. The current and voltage sensitivities of the proposed device are extracted from its transfer characteristics, obtained by combining the numerical solutions of the one-dimensional (1D) Landau-Khalatnikov (L-K) equation with three-dimensional (3D) technology computer-aided design (TCAD) simulations. Results show that the NC-DG-ISFET can surpass the sensitivity of some of the state-of-the-art DG-ISFET pH sensors. The inclusion of the FE layers into the gate stacks of a baseline DG-ISFET leads to 51% reduction in subthreshold swing (SS), causing a 5× increase in current sensitivity (SI) in the subthreshold region of operation and a 2× increase in voltage sensitivity (SV). The influence of channel thickness and channel length on the sensor performance is also invesitgated. The findings presented here provide a new pathway to leverage the steep-switching behavior of NCFETs for the next generation of highly sensitive and label-free DG-ISFET pH sensors.

Analysis of noise behavior and reliability of pocket doped negative capacitance FET under the impact of trap charges and temperature

This paper represents an in-depth investigation of low to high frequency noise performance of highly doped double pocket double gate NCFET (HDDP-DG-NCFET) and single gate NCFET (SG-NCFET) in the existence of Uniform and Gaussian trap charges at various frequencies and temperatures (200 K–400 K). The drain current noise spectral density (Sid) and Gate voltage noise spectral density (Svg) at different frequencies in existence of both type of trap charges are explored. In addition, the Sid as a function of frequency for various ferroelectric thicknesses (Tfe) is examined in the existence of Uniform trap charges. The findings show that, at lower frequencies flicker noise dominates, while at higher frequencies, the dominant noise element is diffusion noise. For the whole range of considered frequencies, the Generation-Recombination (G-R) noise is more substantial in existence of trap charges. It has been found that, the net Sid value of the HDDP-DG-NCFET for Uniform and Gaussian types of trap distribution is 6.98 × 10−14A2/Hz and 6.17 × 10−14A2/Hz, respectively. Moreover, the examination of Sid for various Tfe in presence of traps illustrates the significance of the ferroelectric layer in obtaining lower value of net Sid, particularly in the higher frequency region and the minimal net Sid value for Tfe = 7 nm as compared to other Tfe values. Finally, to examine the device's reliability, the temperature investigation for the noise in the non-existence and existence of trap charges demonstrates that, the impact of an increase in noise caused by the existence of trap charges is much pronounced at lower temperatures and smaller gate voltages, where G-R noise is observed to be the dominant noise component.

Enhanced Proliferation and Differentiation of Human Osteoblasts by Remotely Controlled Magnetic-Field-Induced Electric Stimulation Using Flexible Substrates.

With the progressive aging of the population, bone fractures are an increasing major health concern. Diverse strategies are being studied to reduce the recovery times using nonaggressive treatments. Electrical stimulation (either endogenous or externally applied electric pulses) has been found to be effective in accelerating bone cell proliferation and differentiation. However, the direct insertion of electrodes into tissues can cause undesirable inflammation or infection reactions. As an alternative, magnetoelectric heterostructures (wherein magnetic fields are applied to induce electric polarization) could be used to achieve electric stimulation without the need for implanted electrodes. Here, we develop a magnetoelectric platform based on flexible kapton/FeGa/P(VDF-TrFE) (flexible substrate/magnetostrictive layer/ferroelectric layer) heterostructures for remote magnetic-field-induced electric field stimulation of human osteoblast cells. We show that the use of flexible supports overcomes the clamping effects that typically occur when analogous magnetoelectric structures are grown onto rigid substrates (which preclude strain transfer from the magnetostrictive to the ferroelectric layers). The study of the diverse proliferation and differentiation markers evidence that in all the stages of bone formation (cell proliferation, extracellular matrix maturation, and mineralization), the electrical stimulation of the cells results in a remarkably better performance. The results pave the way for novel strategies for remote cell stimulation based on flexible platforms not only in bone regeneration but also in many other applications where electrical cell stimulation may be beneficial (e.g., neurological diseases or skin regeneration).

Physics-based analytical model for trap assisted biosensing in dual cavity negative capacitance junctionless accumulation mode FET

The design of a ferroelectric-based biosensor for detecting various biomolecules like proteins and DNA has captivated the interest of researchers in early disease diagnostics and treatment monitoring. Doomed by this interest, an analytical model for trap-assisted biosensing in Dual Cavity Negative Capacitance Junctionless Accumulation Mode FET is proposed for detecting various biomolecules. The biomolecules are treated as traps that tunnel through the biosensor's ferroelectric layer. The analytical model is validated through extensive numerical device simulations. The device incorporates the detection of charged and uncharged biomolecules in terms of dielectric constants and biomolecule concentration. The nano-cavities are created inside the gate dielectric stack to collect biomolecules like proteins and DNA. As the biomolecules are infused as traps in cavity areas, electrical properties of the biosensor, like input characteristics, transconductance, threshold voltage, on-state current, and subthreshold swing change. The sensitivity obtained for the proposed biosensor is compared with the existing biosensor and found that it is best suited for susceptible biosensing applications.