Characterization of a compact, high density, and uniform rf line-plasma source has been investigated. Plasma production is conducted in a rectangular discharge chamber (200×100×20 mm3) with a pair of permanent magnets placed on top and bottom of the chamber. A rf current is applied to an internal antenna covered with a quartz tube, and the plasma is produced by an inductive rf discharge. A magnetic field B0 structure of longitudinal line cusps is produced around the edge of the magnets. Ion-saturation current-density Jis profile is controlled by varying the width of the magnets and/or the distance between the antenna and the magnets, because the electrons created in the low-B0 region are reflected in the high-B0 region. The measured Jis profiles are explained by solving the equation of motion for electrons under the cusped magnetic field. A 140 mm wide plasma [plasma density ≃(1.8–2.5)×1012 cm−3 for electron temperature=4–8 eV] of a uniformity variation within 90% is produced using a 140 mm long antenna for an Ar pressure of 20 mTorr and a rf power of 3 kW.
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