Abstract
A high-density and uniform line-plasma source is developed by an inductive rf discharge using a rectangular discharge chamber (200×100×20mm) with a pair of permanent magnets placed on top and bottom of the chamber. Ion-saturation current-density Jis profile is controlled by varying the width of the magnets and the distance between the antenna and the magnets. A 140-mm-wide plasma [plasma density ≃(1.8-2.5)×1012cm−3 for electron temperature =4–8eV] of a uniformity variation within 90% is produced using a 140-mm-long antenna for an Ar pressure of 20mTorr and a rf power of 3kW. The measured Jis profiles are explained by solving the equation of motion for electrons under a magnetic field structure of longitudinal line cusps.
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