Atomic layer deposition of lithium metaphosphate from H3PO4 and P4O10 facilitated via direct liquid injection: Experiment and theory

Abstract

We report the use of H3PO4 as a reactant in atomic layer deposition (ALD) of lithium metaphosphate. The ALD growth cycle starts by injection of the lithium tetramethyl heptadionate (LiTMHD) precursor followed by injection of the H3PO4 reactant. Both the reactant and the precursor are injected into the ALD chamber via direct liquid injection, which allows us to achieve ALD without plasma or high temperatures. The liquid H3PO4 solution, injected 10 s after the precursor, evaporates and decomposes into the gaseous mixture of H3PO4, P4O10, and H2O. The H3PO4 and P4O10 molecules finally react with the LiTMHD molecules adsorbed at the sample substrate, which results in the film growth. The obtained films are amorphous, and the x-ray photoelectron spectroscopy measurements reveal the LiPO3 composition. The growth process exhibits the features of the ALD, namely, the saturation of the growth rate with cycle duration and the maximum growth rate when the number of the injected precursor/reactant molecules reaches a critical value. We show theoretically that the growth rate is governed by the gas-phase equilibrium between H3PO4 and P4O10, both of which are reactive but to different degrees. Depending on the temperature and other conditions, we obtain a reactive gas adjustable at will between pure H3PO4 and pure P4O10. Our theory explains essential features of the observed ALD growth. It determines which of the two reactants (H3PO4 or P4O10) causes the growth and which of them provides a faster growth.