Nickel Electroless Palladium Immersion Gold Research Articles

Microstructural evaluation of interfacial intermetallic compounds between Sn58Bi and ENEPIG

BackgroundLow carbonization and Restriction of Hazardous Substances (RoHS) regulations have promoted the development of low-temperature lead-free solder. The solder and substrate are critical entities of joint connections. MethodsSn58Bi has been considered a promising low-temperature solder. Electroless nickel/electroless palladium/immersion gold (ENEPIG) is a good surface finish that prevents solder joints from oxidizing and extends the shelf life of the substrates. In this study, the interfacial reactions between the Sn58Bi solder and ENEPIG surface finish were systematically analyzed. Findings(Au,Pd,Ni)(Sn,Bi)4 was observed after reflow at 160 °C. Au and Pd dissolved into solder rapidly in the beginning. NiSn4 and Ni3Sn4 with small amounts of Au and Pd dissolution formed at the interface after aging. The morphology of NiSn4 evolved from block-like to needle-shaped and finally to a layered configuration as the aging temperature and time increase. Ni3Sn4 was observed between NiSn4 and substrate above 100 °C. This study established the growth mechanism of intermetallic compounds (IMCs) in the reaction between Sn58Bi and ENEPIG for low-carbon emitting processes.

Investigation of isothermal aged Sn-3Ag-0.5Cu/Sn58Bi-Co hybrid solder joints on ENIG and ENEPIG substrate with various mechanical performances

The stability of solder joints is of utmost critical in electronic equipment. The integration of packaged devices in these systems often leads to the generation of heat, which might have a significant impact on how long the equipment lasts when exposed to high temperatures. It is imperative to perform an isothermal aging test on the solder joints in order to replicate the extended use of these joints. This research looked into how the mechanical characteristics and IMC growth of hybrid solder joints were affected by isothermal aging over 240 h, 480 h and 720 h. The reliability of solder joint under isothermal aging condition was improved by adding Pd coating and Co element. The results revealed that Pd coating over ENIG (Electroless Nickel Immersion Gold) pad reduced the growth rate of IMC in SAC305/SnBi hybrid solder joints during isothermal aging. ENIG solder joint strength dropped by 57.66% after 720 h of isothermal aging, and practically all fractures were IMC fractures. ENEPIG (Electroless Nickel Electroless Palladium Immersion Gold) shear strength lowered 31.01%, IMC fracture mode 20%, strong reliability at high temperature. IMC development was suppressed in SAC305/SnBi-Co hybrid solder joints by higher Co content. After 720 h isothermal aging, SAC305/SnBi-Co solder joints had better shear strength than non-Co joints. According to fracture morphology, SAC305/SnBi-Co hybrid solder joints reliability improves owing to the change of IMC morphology and grain refining.

Investigating the Impact of Final Finishes on the Insertion Loss in As Received and After Aging

The task of the final finish on the printed circuit board is to protect the copper surface and at the same time keep it active for the subsequent assembly steps. In high frequency applications, additionally the impact on the signal loss becomes of interest. Typically, the choice of the final finish is defined by the target application. The demands on solderability and bondability need to be considered and the acceptable price level needs to be defined. For the use in high frequency applications the signal integrity becomes of interest and adds on the reliability criteria such as solder joint reliability or corrosion resistance. In this study various surface finishes were tested towards their performance on insertion loss at high frequency. In contrast to earlier studies the frequency range was investigated up to 150 GHz and the impact of thermal or humid aging of the final finish was evaluated. Overall, seven different finishes have been selected including EPAG (Electroless palladium/Autocatalytic gold), I-Sn (Immersion tin), I-Ag (immersion silver), DIG (direct immersion gold), Au/Pd/Au (Gold/Palladium/Gold), ENIG (Electroless Nickel/Immersion Gold) with high and medium phosphorous Nickel and ENEPIG (Electroless Nickel/Electroless Palladium/Immersion Gold). The paper compiles the data for insertion loss versus frequency for the different final finishes at layer thicknesses as commonly used in the PCB industry. The results in the insertion loss performance are correlated to other properties of the different final finishes such as reliability and assembly performance to identify the best candidates for high frequency applications.

How to Tailor Immersion Tin Plating for IC Substrate Applications

Immersion tin finishes are widely used in the printed circuit board (PCB) industry. They provide reliable connections with high solder joint reliability compared to other final finishes. Due to the direct intermetallic formation between copper and solder, the intermetallic compounds (IMC) formed during the assembly exhibit ductile properties and are less prone to brittle fractures than e.g. solder joints formed with nickel finishes such as electroless nickel/immersion gold (ENIG). With the given high solder joint reliability, the immersion tin finish therefore is one of the first choices for the application in the IC substrate industry. It provides already a robust and nickel free finish with high process efficiency for lower cost. But due to the trends to increased I/O counts, reduced lines and spaces, improved signal integrity and further lowering the cost in the packaging applications, the adjustment of the immersion tin process became necessary to cope with the changed technology demands. Topic of this paper is the introduction of an immersion tin plating process specifically designed for IC substrate applications. It is focusing on three major aspects: the plating process itself, the equipment solutions to realize best quality control and process monitoring and finally the performance of the final finish itself in comparison to other common end finishes. The trend to more and more reduced lines and spaces requires the adjustment of the plating chemistry. A good solution flow needs to be ensured to prevent excessive attack of the copper tracks or disproportionate solder mask undercut. The study presented here compares conventional immersion tin plating solutions with a modified process for IC substrate plating. It shows, how the variation of solution viscosity and flow can impact the copper attack and solder mask undercut. Due to the better solution exchange and adjusted plating conditions, the copper dissolution can be significantly reduced and the attack to the solder mask can be minimized. The complimentary horizontal plating equipment supports the specific properties of the plating electrolyte. Insights to the equipment design and adjustments are being discussed to identify the best conditions for the immersion tin plating on fine structures with highest quality demands. Finally, the tin deposit is investigated and compared to conventional immersion tin as well as to other standard finishes such as ENIG, ENEPIG (Electroless Nickel, electroless Palladium, Immersion gold) or OSP (organic solder preservative) regarding its solder wetting performance and solder joint reliability. It can be concluded that the immersion tin finish designed for small L/S applications can validate the benefits known from the long years’ experience with immersion tin. The layer shows comparable solder wetting properties to conventional immersion tin finishes and excellent solder joint reliability when compared to ENIG or OSP with better performance even after thermal aging. The risk for typical IC substrate related defects such as excessive copper corrosion or solder mask undercut as well as missing bumps is lowered compared to the conventional process. The main focus of this paper is to show, that the high demands in substrate industry can be tackled when the plating solution and plating equipment are designed and adjusted to the new requirements in a coordinated approach so that they can complement each other.

Mixed reaction gold as versatile plating solution for ENIG, ENEPIG and EPAG plating

The surface finish on a printed circuit board (PCB) or substrate serves as surface protection and at the same time enables a variety of assembly techniques. Depending on which final finish is selected it allows for e.g. soldering connections or wire bonding by Al, Au or even Cu-wires. Surface finishes are typically characterized by different metal layers, including tin, nickel, palladium or gold. In this context the electroless or immersion plating of gold has a long history in the electronics industry. The gold plating represents a key step in different finish systems such as electroless nickel/immersion gold (ENIG), electroless nickel/electroless palladium/immersion gold (ENEPIG) and electroless palladium/autocatalytic gold (EPAG). ENIG, ENEPIG and EPAG finishes are characterized by their capabilities to be used as solderable and wire-bondable finish with specific benefits for ENEPIG and EPAG such as enhanced solder joint reliability and gold-wire bondability. In this paper an overview is given on the different types of electroless gold plating electrolytes from fully immersion type and autocatalytic type to mixed reaction type gold electrolytes. The details of the various plating mechanisms are presented, and the different properties and capabilities of these electrolytes are compared and explained based on the respective mechanisms. The presented study investigates the performance of a gold electrolyte of a mixed reaction type looking into the layer properties as well as the soldering and bonding capabilities. The results show that a mixed reaction gold electrolyte can be capable for versatile application- ENIG, ENEPIG and EPAG. The capability of the process was tested with respect to the solder wetting performance, solder joint reliability, wire bonding performance, corrosive attack to the nickel and thickness distribution. It can be shown that this gold process passes or exceeds all related industry standards and target requirements for ENIG, ENEPIG and EPAG final finishes.

Diffusion Barrier Properties of the Intermetallic Compound Layers Formed in the Pt Nanoparticles Alloyed Sn-58Bi Solder Joints Reacted with ENIG and ENEPIG Surface Finishes

Pt-nanoparticle (NP)-alloyed Sn-58Bi solders were reacted with electroless nickel-immersion gold (ENIG) and electroless nickel-electroless palladium-immersion gold (ENEPIG) surface finishes. We investigated formation of intermetallic compounds (IMCs) and their diffusion barrier properties at reaction interfaces as functions of Pt NP content in the composite solders and duration of solid-state aging at 100 °C. At Sn-58Bi-xPt/ENIG interfaces, typical Ni3Sn4/Ni3P(P-rich layer) microstructure was formed. With the large consumption of the Ni-P layer, the Ni-P and Cu layers were intermixed and Cu atoms spread over the composite solder after 500 h of aging. By contrast, a (Pd,Ni)Sn4/thin Ni3Sn4 microstructure was observed at the Sn-58Bi-xPt/ENEPIG interfaces. The (Pd,Ni)Sn4 IMC effectively suppressed the consumption of the Ni-P layer and Ni3Sn4 growth, functioning as a good diffusion barrier. Therefore, the Sn-58Bi-xPt/ENEPIG joint survived 500 h of aging without microstructural degradation. Based on the experimental results and analysis of this study, Sn-58Bi-0.05Pt/ENEPIG is suggested as the optimum combination for future low-temperature soldering systems.

(Invited, Digital Presentation) Fatigue-Resistant of Ag Sinter Joining on Ni-P/Pd/Au Finished DBA Substrate with Thick Ni-P Layer During Thermal Shock Test

The wide band-gap (WBG) semiconductor, such as silicon carbide (SiC) and gallium nitride (GaN), are widely expected to replace conventional Si-based chips, which provide the power modules with higher working temperature larger than 250 degrees. Ag paste sinter joining emerges as a promising alternative for the die attach material in WBG power devices owing to its superior electrical/thermal conductivity as well as a high melting point of 960℃. For Ag paste sinter joining on WBG chip or substrate, most studies are focusing on Ag metallization layers by which the Ag-Ag interface delivers high bonding strength because of the chemical/structural similarity. However, with the superior anti-oxidation/corrosion property, Au metallization layers ensure the Ag-Au joint much wider usage environment than Ag-Ag joint.The study was carried out to develop a highly reliable Ag-Au sintering joint in SiC chip and Direct bonded aluminum (DBA) power modules. The DBA substrate was strengthened by an electroless nickel/electroless palladium/immersion gold (ENEPIG) metallization layer. ENEPIG plated DBA substrate was modified to possess superior mechanical strength by thickening the Ni layer with the thickness of 7µm and 20µm. The reliability of SiC/DBA die-attached module by Ag-Au joining was evaluated during a long-term thermal shock test (TST) from -50℃ to 250℃ up to 1000 cycles. In the case DBA with a Ni metallization layer of 7µm, severe plastic deformation occurred at the Ag-Au interface. By thickened ENEPIG layer with Ni-P layer to 20µm, the Ag-Au interfacial deformation derived from Al plastic deformation was successfully suppressed even after 1000 cycles. The shear strength of as-sintered Ag-Au joint was evaluated to be larger than 35 MPa, but degradation was still found to be the interfacial delamination between Ag paste and ENEPIG substrate during thermal shock test for the two ENEPIG metallization cases. The bonding interface and fracture characteristics were systematically investigated, which provide basic understanding between microstructural evolution and reliability of Ag-Au joint during TST.

(Invited, Digital Presentation) Fatigue-Resistant of Ag Sinter Joining on Ni-P/Pd/Au Finished DBA Substrate with Thick Ni-P Layer During Thermal Shock Test

In this study, a highly reliable Ag sinter joining on Direct bonded aluminum (DBA) substrate was introduced in SiC power modules. The electroless nickel /electroless palladium/immersion gold (ENEPIG) metallization layer was coated on the DBA substrate with the electroless nickel layer of 7µm and 20 µm. The reliability of SiC/DBA die-attached module by Ag sinter joining was evaluated by thermal shock test (TST) from -50℃ to 250℃ up to 1000 cycles. In the case DBA with the Ni metallization layer of 7µm, severe ups and downs deformation occurred from the Al layer during the TST, leading to uneven variation of sintered Ag layer. The deformation was suppressed when the Ni layer increased to 20 µm. The bonding interface and fracture characteristics were systematically investigated for the both cases, which provide basic understanding the Ag-Au reliability by the design for the metallization layer on substrate.

Interfacial Microstructure and Mechanical Reliability of Sn-58Bi/ENEPIG Solder Joints

The 42 wt.% Sn–58 wt.% Bi (Sn-58Bi) Ball Grid Array (BGA) solder balls were mounted to electroless nickel-electroless palladium-immersion gold (ENEPIG) pads by employing the reflow process profile. The effects of reflow cycles and aging time on the interfacial microstructure and growth behavior of intermetallic compounds, as well as the mechanical properties, were investigated. Pd-Au-Sn intermetallic compound (IMC) was formed at the Sn-58Bi/ENEPIG interface. With the increase in reflow cycles and aging time, the IMC grew gradually. After five reflow cycles, the shear strength of the Sn-58Bi/ENEPIG solder joints first decreased and then increased. After 500 h of aging duration under −40 °C, the shear strength of the Sn-58Bi/ENEPIG solder joints decreased by about 12.3%. The fracture mode transferred from ductile fracture to ductile and brittle mixed fracture owing to the fact that the fracture location transferred from the solder matrix to the IMC interface with the increase in reflow cycles and aging time.

Effective (Pd,Ni)Sn4 diffusion barrier to suppress brittle fracture at Sn-58Bi-xAg solder joint with Ni(P)/Pd(P)/Au metallization pad

In this study, we investigated the interfacial reactions and mechanical properties of Sn58Bi solders alloyed with Ag nanoparticles (NPs) after bonding with electroless nickel-immersion gold (ENIG) or electroless nickel-electroless palladium-immersion gold (ENEPIG) surface finish. On the ENIG surface finish, Ni3Sn4, Ni-Sn-P, and Ni3P layers were sequentially formed on the Ni(P) layer. On the ENEPIG surface finish, (Pd,Ni)Sn4 intermetallic compound was formed on thin Ni3Sn4/Ni3P on the Ni(P) layer, and it survived nine reflow cycles, unlike Sn-Ag-Cu solder joints in previous studies. This effectively stopped the formation of the Ni-Sn-P layer, which acted as an effective diffusion barrier to suppress the consumption of Ni in the Ni(P) layer. A mixed-mode fracture—partially through the bulk solder (ductile mode) and partially through Kirkendall voids in the Ni-Sn-P layer (brittle mode)—was observed with the Sn-58Bi-xAg/ENIG joint, whereas only ductile fracture was observed with the Sn-58Bi-xAg/ENEPIG joint. Alloying with 0.5 wt% Ag NPs strengthened the composite solder by refining the eutectic microstructure of the Sn58Bi solder and by inducing precipitation hardening with fine Ag3Sn particles. However, the addition of more Ag NPs led to mechanical degradation by re-coarsening of the eutectic microstructure and by providing an easy fracture path along the coarsened Ag3Sn/solder interface. The highest shear strength was obtained with Sn-58Bi-0.5Ag/ENEPIG, which was suggested to be the most reliable system for low-temperature soldering at 200 °C.

Effect of the Electroless Nickel, Electroless Palladium, and Immersion Gold Multilayer as a Diffusion Barrier on the Bonding Strength of BiTe-Based Thermoelectric Modules.

An effective diffusion barrier layer was coated onto the surface of BiTe-based materials to avoid the formation of brittle intermetallic compounds (IMCs) by the diffusion of the constituents of Sn-based solder alloys into the BiTe-based alloys. In this study, the electrochemical deposition of multi-layers, i.e., electroless nickel/electroless palladium/immersion gold (ENEPIG) was explored to enhance the bonding strength of BiTe materials with Cu electrodes. The thermoelectric modules with the ENEPIG plating layer exhibited high bonding strengths of 8.96 MPa and 7.28 MPa for the n- and p-type, respectively that increased slightly to 9.26 MPa and 7.76 MPa, respectively after the thermoelectric modules were heated at 200 °C for 200 h. These bonding strengths were significantly higher than that of the thermoelectric modules without a plating layer.

Comparative study between the Sn–Ag–Cu/ENIG and Sn–Ag–Cu/ENEPIG solder joints under extreme temperature thermal shock

The interfacial reactions and the growth behavior of interfacial intermetallic compounds (IMCs), as well as their effects on the mechanical properties of the Sn-3.0Ag-0.5Cu (SAC305)/electroless nickel-electroless palladium-immersion gold (ENEPIG) solder joints under extreme temperature thermal shock between − 196 °C and + 150 °C were investigated, and compared with those of the SAC305/electroless nickel-immersion gold (ENIG) solder joints. The morphology of (Cu, Ni)6Sn5 IMCs formed at the SAC305/ENIG interface transformed from column-type to polygon-type during extreme temperature thermal shock, while the needle-type and thin-layer-type (Cu, Ni, Pd)6Sn5 IMCs at the SAC305/ENEPIG interface completely transformed to chunk-type. The growth rate of interfacial IMCs in the SAC305/ENEPIG joint was slower in contrast to that in the SAC305/ENIG joint, since the Pd(P) layer in the ENEPIG surface finish inhibited the formation and growth of interfacial IMCs. After thermal shock for 400 cycles, the shear force of the SAC305/ENIG and SAC305/ENEPIG joints decreased about 29.06% and 9.79%, respectively. Moreover, the shear force of the SAC305/ENEPIG joints was consistently higher than that of the SAC305/ENIG joints. The SAC305/ENEPIG joints always fractured in the solder matrix, regardless of thermal shock cycles, while the fracture location of the SAC305/ENIG joints transferred from inside the solder matrix to partially inside the solder matrix and partially at the solder/IMC layer interface with increasing thermal shock cycles.

Interface reaction and evolution of micron-sized Ag particles paste joining on electroless Ni-/Pd-/Au-finished DBA and DBC substrates during extreme thermal shock test

The fracture behaviors and Ag–Au joint interface evolution of sintered micron-sized Ag particles paste joined on an electroless nickel/electroless palladium/immersion gold (ENEPIG)-plated direct-bonded aluminum (DBA) and direct-bonded copper (DBC) substrates are evaluated during an extreme thermal shock test (TST) from −50–250 °C. The die shear strength of the as-sintered Ag joint on the DBA substrate is evaluated to be 33.5 MPa at a sintering temperature of 200 °C without any assisted pressure, which decreased gradually with an increase in the thermal cycling number. The shear strength declined slightly but remained at approximately 20 MPa; subsequently, it decreased considerably to 11.2 MPa after 1000 cycles. Coarsening of the sintered Ag layer is observed as the microstructure inhomogeneity and vertical cracks increased after 1000 cycles. In addition, the Al layer induced a greater undulate deformation, resulting in a sintered Ag layer exhibiting partial compression and tension after a TST. The sintered Ag layer became dense with a significant decrease in porosity at the compression parts and large horizontal cracks appeared at the tension parts. Both of horizontal cracks and vertical cracks led to fracture mode change and shear strength decrease. The Ag–Au joint interdiffusion layer became thicker during thermal shock with the gradual diffusion of the Au atoms into the sintered Ag layer. The die shear strength of the as-sintered Ag joint on the DBC substrates is evaluated as 34.4 MPa at 200 °C sintering but decreased to 0 MPa after 250 thermal shock cycles owing to the stress-induced delamination between the Ag and Au interdiffusion layer and sintered Ag layer. This study provides insights into the interface reaction and evolution of sintered Ag on ENEPIG-finished DBA and DBC substrates for applications at high temperatures.

Effect of Ni(P) thickness in Au/Pd/Ni(P) surface finish on the electrical reliability of Sn–3.0Ag–0.5Cu solder joints during current-stressing

The effects of Ni(P) layer thickness (5 μm and 0.7 μm) on the microstructural behavior and electrical reliability of electroless-nickel electroless-palladium immersion gold (ENEPIG) (substrate-side) surface-finished printed circuit boards (PCBs) with Sn–3.0Ag–0.5Cu (SAC305) solder joints under current stressing of 9000 A/cm2 have been investigated. An organic solderability preservative (OSP) surface finish was applied on the chip-side. (Cu,Ni)6Sn5 and Cu6Sn5 intermetallic compound (IMC) layers were formed on the chip-side (the interface between SAC305 and the OSP surface finish) and substrate-side (the interface between the ENEPIG surface finish and SAC305) solder joints after reflow. The thicknesses of the (Cu,Ni)6Sn5 and Cu6Sn5 IMC layers of the chip- and substrate-side of the normal- and thin-ENEPIG/SAC305/OSP solder joints increased with increasing current stressing time, regardless of the nickel phosphorous (Ni(P)) layer thickness. The total IMC thicknesses of normal-ENEPIG/SAC305/OSP solder joints were relatively thinner than those of thin-ENEPIG/SAC305/OSP solder joints under current stressing for 50–120 h. This is the reason why only a P-rich Ni layer was formed at the interface between SAC305 solder and the Cu pad in the thin-ENEPIG/SAC305 solder joints under current stressing. Otherwise, the P-rich Ni and Ni(P) layers remained at the interface of the normal-ENEPIG/SAC305 solder joint under current stressing. The Ni(P) layer of the ENEPIG surface finish played an important diffusion barrier role by suppressing IMC growth and movement toward the SAC305 solder under current stressing. In the electrical evaluation, the time to failure at the normal-ENEPIG solder joint was relatively longer (approximately 2.2 times) than that of the thin-ENEPIG solder joint. Therefore, the relatively thick Ni(P) layer contained in the ENEPIG/SAC305/OSP solder joint is expected to attain higher electrical reliability under the electromigration test.

Effects of Temperature–Humidity Treatment on Bending Reliability of Epoxy Sn–58Bi Solder with Electroless Nickel Immersion Gold (ENIG) and Electroless Nickel Electroless Palladium Immersion Gold (ENEPIG) Surface Finishes

An epoxy Sn–58wt.%Bi solder joint was evaluated by a three-point bending test with electroless nickel immersion gold (ENIG) and electroless nickel electroless palladium immersion gold (ENEPIG) surface finishes aged at 85 °C and 85% relative humidity. Scanning electron microscopy and electron probe microanalysis were carried out to study intermetallic compound variation. The morphology, total thickness, and chemical composition of intermetallic compound in epoxy Sn58Bi solder joints were the same as those of Sn–58wt.%Bi solder joints with each surface finish. The average number of bending-to-failure cycles for the epoxy Sn–58wt.%Bi solder/ENIG joints and epoxy Sn–58wt.%Bi solder/ENEPIG was more than 4000 and 5000, respectively. The average number of bending-to-failure cycles of the epoxy Sn–58wt.%Bi solder joint decreased with increasing age. Three-point bending reliability of epoxy Sn–58wt.%Bi solder joints was higher than that of Sn–58wt.%Bi solder with both surface finishes. Cracking of all solder joints subjected to as-reflowed was propagated through the solder matrix. However, after aging for 1000 h, cracking occurred primarily between intermetallic compound layers.

Interfacial reactions and mechanical properties of Sn–3.0Ag–0.5Cu solder with pure Pd or Pd(P) layers containing thin-Au/Pd/Ni(P) surface-finished PCBs during aging

The microelectronics packaging industry, although rapidly growing, faces several challenges including 3-D integration, issues with multifunctional capability, and fluctuating input/output (I/O) density, among others. Better-performing microelectronics assemblies for mitigating these challenges require alloys with superior solderability and minimal metallization layer thickness. To this end, in this study, we investigated two kinds of electroless-nickel electroless-palladium immersion gold (ENEPIG) with 0.3 μm Ni, 0.1 μm pure Pd or Pd-phosphorous (Pd(P)), and 0.1 μm Au layers plated on a printed circuit board (PCB) substrate. To analyze the effects of the pure Pd and Pd(P) layers in the thin ENEPIG, we evaluated the interfacial reactions and mechanical properties of the SAC305 solder with a pure Pd or Pd(P) layer in the thin ENEPIG joints after aging at 150 °C. Needle-type and chunky-type (Cu,Ni)6Sn5 IMCs were formed at the interfaces of the pure Pd and Pd(P) joints, respectively. The (Cu,Ni)6Sn5 IMC of the pure Pd joint was thinner than that of the Pd(P) joint after reflowing and aging for 100 h. However, the total IMC of the Pd(P) joint was thinner than that of the pure Pd joint from 250 to 1000 h. In a low-speed shear test, the shear strength of the Pd(P) joint was higher than that of the pure Pd joint for the entire aging time. Most fractures occurred at the Sn-rich surface with a ductile mode, regardless of the different substrates and aging times. After high-speed shear testing, the shear strength of the pure Pd joint was higher than that of the Pd(P) joint until aging for 100 h. After aging for 250 h, the shear strength of the Pd(P) joint was higher than that of the pure Pd joint. The results for brittle fracture rate were similar to those for high-speed shear strength. Hence, Pd(P) joints are expected to demonstrate higher reliabilities than pure Pd joints after long aging treatment.

Effects of a phosphorous-containing Pd layer in a thin-ENEPIG surface finish on the interfacial reactions and mechanical strength of a Sn–58Bi solder joint

We analyzed the effects of phosphorous (P) in a palladium (Pd) layer on the interfacial reactions and mechanical properties of Sn–58Bi solder with thin electroless-nickel electroless-palladium immersion gold (ENEPIG) joints (pure Pd and Pd(P) joints) after a high-temperature storage test. Flake-type (Pd,Au)Sn4 intermetallic compounds (IMCs) mainly formed in the pure Pd and Pd(P) joints. After being aged at 85–115 °C for 300 h, top- and bottom-side (Cu,Ni)6Sn5 IMCs formed at the interface between the (Pd,Au)Sn4 IMC and partially destroyed P-rich Ni layer of the pure Pd joints. In contrast, a Ni3Sn4 IMC formed at the interface between the (Pd,Au)Sn4 IMC and P-rich Ni layer of the Pd(P) joints after most aging temperatures and durations. This is because the reaction rate of the Pd(P) joint was lower than that of the pure Pd joints. The unreacted Ni layer remained at the Pd(P) joints after aging. In a high-speed shear test, the shear strength of the pure Pd joints rapidly decreased after being aged at 115 °C for 100 h. In contrast, the shear strength of the Pd(P) joints slightly decreased after being aged at 115 °C for 1000 h. The shear strengths of the pure Pd and Pd(P) joints were quite different under same aging conditions because of the different diffusion rates and IMC compositions of the pure Pd and Pd(P) joints. Fracture surfaces of the pure Pd joints after being aged at 115 °C were observed on the Cu substrate, but those of the Pd(P) joints were on the Ni3Sn4 IMC surface. Therefore, the Sn–58Bi solder with a Pd(P) layer in thin-ENEPIG is expected to be more reliable than that with pure Pd joints under aging treatment.

Effects of Ni layer thickness of thin-ENEPIG surface finishes on the interfacial reactions and shear strength of Sn-3.0Ag–0.5Cu solder joints during aging

The effects of the thickness of the Ni layer in thin electroless-nickel electroless-palladium immersion gold (thin-ENEPIG) surface-finished printed circuit boards (PCB) with Sn-3.0Ag–0.5Cu (SAC305) solder joints during aging treatment were investigated. We evaluated the interfacial reactions and mechanical properties of 0.3–1.0 µm thick Ni layers in thin-ENEPIG PCBs with SAC305 solder joints at aging temperatures of 75, 100, 125, and 150 °C for 1000 h. A needle-type (Cu,aNi)6Sn5 intermetallic compound (IMC) layer formed at the interface of the SAC solder and Cu substrate. In addition, P-rich Ni layers were formed at the interface of the (Cu,Ni)6Sn5 IMC and Cu substrate for the 0.5–1.0 µm thick Ni joints. The thicknesses of the (Cu,Ni)6Sn5 IMCs with 0.3 and 0.5 µm Ni joints were strongly affected by the aging time and temperature. In contrast, the IMC growth rates of the 0.7 and 1.0 µm thick Ni joints were significantly lower than that of the 0.3 µm thick Ni joint. The reason for this behavior is that the P-rich Ni layer acts as a barrier for Sn and Cu diffusion at the joint and was maintained at the IMC/Cu interface after aging. In high-speed shear tests, the shear strengths of all Ni joints aged at 75 °C were similar. However, the rate of reduction in shear strength decreased with increasing Ni layer thickness as the aging time and temperature increased, but the shear strength of the 0.3 µm Ni joint rapidly decreased with increasing aging temperature and time. In contrast, the shear strengths of the 0.7 and 1.0 µm Ni joints slightly decreased with increasing aging temperature and time. The brittle fracture rates of the joints decreased with increasing Ni thickness, and we determined that this occurred because of the remaining P-rich Ni layer, which acts as a diffusion barrier during aging, at the interface of the 0.7 and 1.0 µm Ni joints. In low-speed shear tests, the shear strengths of the 0.7 and 1.0 µm Ni joints were slightly higher than those of the 0.3 and 0.5 µm Ni joints after aging at 125 and 150 °C for the entire aging period. Most fractures occurred via a ductile mode regardless of the Ni layer thickness. Therefore, a Ni layer thickness of more than 0.7 µm in thin-ENEPIG finished PCB with SAC305 solder joints is expected to yield high reliability on aging.

Effect of Epoxy on Mechanical Property of SAC305 Solder Joint with Various Surface Finishes Under 3-Point Bend Test.

Microstructures and mechanical property of Sn-3.0Ag-0.5Cu (SAC305) and epoxy Sn-3.0Ag-0.5Cu (epoxy SAC) solder joints were investigated with various surface finishes; organic solderability preservative (OSP), electroless nickel immersion gold (ENIG) and electroless nickel electroless palladium immersion gold (ENEPIG). Bending property of solder joints was evaluated by 3-point bend test method. Microstructure and chemical composition of solder joints was characterized by scanning electron microscope (SEM) and energy dispersive X-ray spectroscopy (EDX), respectively. Epoxy did not effect on intermetallic compound (IMC) morphology. Scalloped shaped Cu6Sn5 IMC was observed at OSP surface finish. Chunky-like shaped and needle-like shaped (Ni,Cu)6Sn5 IMC were observed at the solder/ENIG joint and solder/ENEPIG joint, respectively. The bending cycles of SAC305/OSP joint, SAC305/ENIG joints and SAC305/ENEPIG joints were 720, 440 and 481 cycle numbers. The bending cycles of epoxy SAC and three types surface finished solder joints were over 1000 bending cycles. Under OSP surface finish, bending cycles of epoxy SAC solder was approximately 1.5 times higher than those of SAC305 solder joint. Bending cycles of epoxy SAC solder was over twice times higher than those of SAC305 solder with ENIG and ENEPIG surface finishes. The bending property of epoxy solder joint was enhanced due to epoxy fillet held the solder joint.

Electroless Under Bump Metallurgy Deposition on Batches of Singulated Semiconductor Die

Multi project-wafers (MPWs) offer cost-effective options for fabrication of application specific integrated circuits (ASICs) produced for entities not requiring a large volume of die from a dedicated full wafer run at an advanced semiconductor foundry. MPWs consist of a mixture of different devices shared on a single wafer; thereby reducing cost of processing by allowing the purchase of real estate allotted to each device. This practice is advantageous for those in academia or government that often only require small quantities of devices for research or niche applications. With many teams investing in a single wafer run, strict design rules must be followed on these microelectronic chips. In particular, the metal used in the final routing layer must be AlCu. This AlCu metallization is not compatible with solder connections for flip chip bonding applications because solder is unable to wet AlCu. To allow MPW die integration with flip chip bonding applications, a solder compatible under bump metallization (UBM) must be deposited on top of the AlCu. This UBM deposition can be achieved through physical vapor deposition and subsequent electrolytic plating into a photolithography defined plating mold. Unfortunately, photolithographic processes are only compatible with full wafers and not with singulated die. This leaves electroless deposition methods such as immersion tin or zinc followed by electroless nickel, electroless palladium, immersion gold (ENEPIG) or electroless nickel and immersion gold (ENIG) as the only options for depositing a wettable UBM on MPW die. Electroless deposition can be performed with a single die at a time, however this process is not well suited for manufacturing. In this work, we have developed a scheme for batch level UBM deposition on singulated semiconductor die by coupling temporary bonding with electroless deposition. A unique batch approach is proposed to electrolessly deposit UBM to terminal AlCu on MPW die. Preliminary Si sidewall passivation is used to eliminate metallization of unintended surfaces in subsequent steps. Temporary custom fixturing onto a carrier substrate is leveraged allowing a variety of devices to be processed like a full wafer, establishing feasibility for industrial scaling. The bulk aluminum oxide is then solubilized by chemical etching and replaced by reduction of Sn as a base layer for ENIG and ENEPIG processes as seen in Figure 1. After metal deposition, devices are liberated from the temporary mounting substrate making them ready for flip chip bonding. Due to creating an UBM through electroless processes, options for interposer bumps are limited and outlined in Figure 2. Solder bonds from Cu pillars topped with SnAg or electroplated with either AuSn or SnAg allow a reflow solder attachment to complete electrical contact between the two chips. Electroplated Au bumps allow for a thermocompression bond to be made between the two chips. Both methods have benefits based on circumstance. Reflow solder is advantageous for fragile chips that cannot withstand the high pressure associated with thermocompression. Cu pillars are also attractive for RF devices in that Cu offers reduced electrical parisitics. Thermocompression is advantageous because it does not require high level of uniformity in the final Au bump. In this presentation, we will provide details on the passivation, batch level handling process, uniformity, and yield statistics for the electroless deposition. Supported by the Laboratory Directed Research and Development program at Sandia National Laboratories, a multimission laboratory managed and operated by National Technology and Engineering Solutions of Sandia, LLC., a wholly owned subsidiary of Honeywell International, Inc., for the U.S. Department of Energy’s National Nuclear Security Administration under contract DE-NA-0003525. Figure 1