The impact of band-edge nonparabolicity on the charge carrier transport in degenerate n-type indium-tin-oxide (ITO) thin films has been investigated theoretically in order to understand the fundamental concepts of electron scattering in such materials regardless of the precise details of the preparation procedure. The Fermi energy level and the scattering parameter of the ITO thin films have been calculated as functions of the carrier concentration. The results indicate that the nonparabolicity has a drastic effect on the total mobility of carriers in the films. We have also discussed the role of grain boundaries in carrier transport. Additionally, to survey the dominant scattering mechanism in the grain bulk of ITO films, we have calculated the scattering parameter. The evaluated values lie near the trend expected for ionized impurity scattering.
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