The anisotropic electron mobility of unintentionally doped, single crystalline, bulk, rutile SnO2(100) and (110) wafers is investigated by van der Pauw-Hall measurements. The room temperature average Hall electron mobility of μ ≈ 220 cm2/V s at a Hall electron concentration of n ≈ 1018 cm−3 suggests high-quality samples. The extracted 1.26 times higher mobility in the c-direction than perpendicular to it is in very good agreement with the corresponding anisotropy of the effective electron mass, which is 1.28 times higher perpendicular to c than parallel to c, suggesting rather isotropic scattering mechanisms. At temperatures below 100 K, a higher mobility anisotropy is found and tentatively attributed to low-angle grain boundaries with a surprisingly low energy barrier. Thus, the efficiency of mobility-sensitive applications, such as field effect transistors, increases by aligning the transport direction with the c-direction of the crystal. For transparent contact applications, such as Sb- or F-doped SnO2 (termed “ATO” or “FTO,” respectively), this benefit is expected to be even larger due to the increasing effective mass anisotropy with the increasing electron concentration.
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