Donor Qubits In Silicon Research Articles

Superexchange coupling of donor qubits in silicon

Atomic engineering in a solid-state material has the potential to functionalize the host with novel phenomena. STM-based lithographic techniques have enabled the placement of individual phosphorus atoms at selective lattice sites of silicon with atomic precision. Here we show that by placing four phosphorus donors spaced 10–15 nm apart from their neighbors in a linear chain, one can realize coherent spin coupling between the end dopants of the chain, analogous to the superexchange interaction in magnetic materials. Since phosphorus atoms are a promising building block of a silicon quantum computer, this enables spin coupling between their bound electrons beyond nearest neighbors, allowing the qubits to be separated by 30–45 nm. The added flexibility in architecture brought about by this long-range coupling not only reduces gate densities but can also reduce correlated noise between qubits from local noise sources that are detrimental to error-correction codes. We base our calculations on a full-configuration-interaction technique in the atomistic tight-binding basis, solving the four-electron problem exactly, over a domain of a million silicon atoms. Our calculations show that superexchange can be tuned electrically through gate voltages where it is less sensitive to charge noise and donor-placement errors. Published by the American Physical Society 2024

A Quantum Computer Architecture Based on Silicon Donor Qubits Coupled by Photons

AbstractA comprehensive circuit architecture and a protocol for realizing 3D cluster states through photonic‐measurement‐based donor‐spin‐qubit entanglement and readout are described. The basic building blocks and protocol are chosen to be compatible with a fully integrated photonic circuit implementation, using Se+ as the photonically coupled matter qubit. The basic operational building blocks of this universal quantum computing machine are local measurements and unitaries, plus an entangling measurement of non‐local Pauli operators. By analyzing several sources of error, a theoretical fault‐tolerant threshold value is estimated on the order of 1%. Considering the literature where required components have already been realized in integrated silicon circuits, albeit not all on the same chip, this suggests the threshold is within reach.

A two-qubit gate between phosphorus donor electrons in silicon.

Electron spin qubits formed by atoms in silicon have large (tens of millielectronvolts) orbital energies and weak spin-orbit coupling, giving rise to isolated electron spin ground states with coherence times of seconds1,2. High-fidelity (more than 99.9 per cent) coherent control of such qubits has been demonstrated3, promising an attractive platform for quantum computing. However, inter-qubit coupling-which is essential for realizing large-scale circuits in atom-based qubits-has not yet been achieved. Exchange interactions between electron spins4,5 promise fast (gigahertz) gate operations with two-qubit gates, as recently demonstrated in gate-defined silicon quantum dots6-10. However, creating a tunable exchange interaction between two electrons bound to phosphorus atom qubits has not been possible until now. This is because it is difficult to determine the atomic distance required to turn the exchange interaction on and off while aligning the atomic circuitry for high-fidelity, independent spin readout. Here we report a fast (about 800 picoseconds) [Formula: see text] two-qubit exchange gate between phosphorus donor electron spin qubits in silicon using independent single-shot spin readout with a readoutfidelity of about 94 per cent on a complete set of basis states. By engineering qubit placement on the atomic scale, we provide a route to the realization and efficient characterization of multi-qubit quantum circuits based on donor qubits in silicon.

Characterization of the Si : Se+ Spin-Photon Interface

Silicon is the most developed electronic and photonic technological platform and hosts some of the highest-performance spin and photonic qubits developed to date. A hybrid quantum technology harnessing an efficient spin-photon interface in silicon would unlock considerable potential by enabling ultra-long-lived photonic memories, distributed quantum networks, microwave to optical photon converters, and spin-based quantum processors, all linked using integrated silicon photonics. However, the indirect bandgap of silicon makes identification of efficient spin-photon interfaces nontrivial. Here we build upon the recent identification of chalcogen donors as a promising spin-photon interface in silicon. We determined that the spin-dependent optical degree of freedom has a transition dipole moment stronger than previously thought (here 1.96(8) Debye), and the T1 spin lifetime in low magnetic fields is longer than previously thought (> 4.6(1.5) hours). We furthermore determined the optical excited state lifetime (7.7(4) ns), and therefore the natural radiative efficiency (0.80(9) %), and by measuring the phonon sideband, determined the zero-phonon emission fraction (16(1) %). Taken together, these parameters indicate that an integrated quantum optoelectronic platform based upon chalcogen donor qubits in silicon is well within reach of current capabilities.

Statistical exchange-coupling errors and the practicality of scalable silicon donor qubits

Recent experimental efforts have led to considerable interest in donor-based localized electron spins in Si as viable qubits for a scalable silicon quantum computer. With the use of isotopically purified 28Si and the realization of extremely long spin coherence time in single-donor electrons, the recent experimental focus is on two-coupled donors with the eventual goal of a scaled-up quantum circuit. Motivated by this development, we simulate the statistical distribution of the exchange coupling J between a pair of donors under realistic donor placement straggles, and quantify the errors relative to the intended J value. With J values in a broad range of donor-pair separation (5<|R|<60 nm), we work out various cases systematically, for a target donor separation R0 along the [001], [110] and [111] Si crystallographic directions, with |R0|=10,20 or 30 nm and standard deviation σR=1,2,5 or 10 nm. Our extensive theoretical results demonstrate the great challenge for a prescribed J gate even with just a donor pair, a first step for any scalable Si-donor-based quantum computer.

A computational workflow for designing silicon donor qubits

Developing devices that can reliably and accurately demonstrate the principles of superposition and entanglement is an on-going challenge for the quantum computing community. Modeling and simulation offer attractive means of testing early device designs and establishing expectations for operational performance. However, the complex integrated material systems required by quantum device designs are not captured by any single existing computational modeling method. We examine the development and analysis of a multi-staged computational workflow that can be used to design and characterize silicon donor qubit systems with modeling and simulation. Our approach integrates quantum chemistry calculations with electrostatic field solvers to perform detailed simulations of a phosphorus dopant in silicon. We show how atomistic details can be synthesized into an operational model for the logical gates that define quantum computation in this particular technology. The resulting computational workflow realizes a design tool for silicon donor qubits that can help verify and validate current and near-term experimental devices.

Valley-enhanced fast relaxation of gate-controlled donor qubits in silicon

Gate control of donor electrons near interfaces is a generic ingredient of donor-based quantum computing. Here, we address the question: how is the phonon-assisted qubit relaxation time T1 affected as the electron is shuttled between the donor and the interface? We focus on the example of the ‘flip-flop qubit’ (Tosi et al arXiv:1509.08538v1), defined as a combination of the nuclear and electronic states of a phosphorus donor in silicon, promising fast electrical control and long dephasing times when the electron is halfway between the donor and the interface. We theoretically describe orbital relaxation, flip-flop relaxation, and electron spin relaxation. We estimate that the flip-flop qubit relaxation time can be of the order of 100 μs, 8 orders of magnitude shorter than the value for an on-donor electron in bulk silicon, and a few orders of magnitude shorter (longer) than the predicted inhomogeneous dephasing time (gate times). All three relaxation processes are boosted by (i) the nontrivial valley structure of the electron–phonon interaction, and (ii) the different valley compositions of the involved electronic states.

Highly tunable exchange in donor qubits in silicon

AbstractIn this article we have investigated the electrical control of the exchange coupling (J) between donor-bound electrons in silicon with a detuning gate bias, crucial for the implementation of the two-qubit gate in a silicon quantum computer. We found that the asymmetric 2P–1P system provides a highly tunable exchange curve with mitigated J-oscillation, in which 5 orders of magnitude change in the exchange coupling can be achieved using a modest range of electric field (3 MV/m) for ~15-nm qubit separation. Compared with the barrier gate control of exchange in the Kane qubit, the detuning gate design reduces the gate density by a factor of ~2. By combining large-scale atomistic tight-binding method with a full configuration interaction technique, we captured the full two-electron spectrum of gated donors, providing state-of-the-art calculations of exchange energy in 1P–1P and 2P–1P qubits.

Multiqubit gates protected by adiabaticity and dynamical decoupling applicable to donor qubits in silicon

We present a strategy for producing multi-qubit gates that promise high fidelity with minimal tuning requirements. Our strategy combines gap protection from the adiabatic theorem with dynamical decoupling in a complementary manner. To avoid degenerate states and maximize the benefit of the gap protection, the scheme is best suited when there are two different kinds of qubits (not mutually resonant). Furthermore, we require a robust operating point in control space where the qubits interact with little sensitivity to noise. This allows us to circumvent a No-Go theorem that prevents block-box dynamically corrected gates [Phys. Rev. A 80, 032314 (2009)]. We show how to apply our strategy to an architecture in Si with P donors where we assume we can shuttle electrons between different donors. Electron spins act as mobile ancillary qubits and P nuclear spins act as long-lived data qubits. This system can have a very robust operating point where the electron spin is bound to a donor in the quadratic Stark shift regime. High fidelity single qubit gates may be performed using well-established global magnetic resonance pulse sequences. Single electron spin preparation and measurement has also been demonstrated. Putting this all together, we present a robust universal gate set for quantum computation.

Device fabrication and transport measurements of FinFETs built with 28Si SOI wafers toward donor qubits in silicon

We report on the fabrication of transistors in a FinFET geometry using isotopically purified silicon-28-on-insulator (28-SOI) substrates. Donor electron spin coherence in natural silicon is limited by spectral diffusion due to the residual 29Si nuclear spin bath, making isotopically enriched nuclear spin-free 28Si substrates a promising candidate for forming spin quantum bit devices. The FinFET architecture is fully compatible with single-ion implant detection for donor-based qubits and the donor spin-state readout through electrical detection of spin resonance. We describe device processing steps and discuss results on electrical transport measurements at 0.3 K.