Ultrafiltration (UF) is widely used in drinking water plants; however, membrane fouling is unavoidable. Natural organic matter (NOM) is commonly considered as an important pollutant that causes membrane fouling. Herein, we proposed VUV/H2O2 as a UF pretreatment and used UV/H2O2 for comparison. Compared to UV/H2O2, the VUV/H2O2 system presented superior NOM removal. In the VUV/H2O2 system, the steady-state concentration of HO• was approximately twice that in the UV/H2O2 system, which was ascribed to the promoting effect of the 185 nm photons. Specifically, 185 nm photons promoted HO• generation by decomposing mainly H2O at a low H2O2 dose or by decomposing mainly H2O2 at a high H2O2 dose. The VUV/H2O2 pretreatment also demonstrated better membrane fouling mitigation performance than did UV/H2O2. An increase in the H2O2 dose promoted HO• generation, thereby enhancing the performance of NOM degradation and membrane fouling alleviation and shifting the major membrane fouling mechanism from cake filtration to standard blocking. The VUV/H2O2 (0.60 mM) pretreatment effectively reduced disinfection byproducts (DBPs) formation during chlorine disinfection. Additionally, the oxidant H2O2 affected the membrane surface morphology and performance but had no evident effect on the mechanical properties. In actual water treatment, the VUV/H2O2 pretreatment exhibited better performance than the UV/H2O2 pretreatment in easing membrane fouling, ameliorating water quality, and reducing DBPs formation and acute toxicity.
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