We have developed microstructured Lu2O3:Eu scintillator films capable of providing spatial resolution on the order of micrometers for hard X-ray imaging. In addition to their extraordinary resolution, Lu2O3:Eu films simultaneously provide high absorption efficiency for 20 to 100 keV X-rays, and bright 610 nm emission, with intensity rivalling that of the brightest known scintillators. At present, high spatial resolution of such a magnitude is achieved using ultra-thin scintillators measuring only about 1 to 5 μm in thickness, which limits absorption efficiency to ~3% for 12 keV X-rays and less than 0.1% for 20 to 100 keV X-rays, resulting in excessive measurement time and exposure to the specimen. Lu2O3:Eu would significantly improve that (99.9% @12 keV and 30% @ 70 keV). Important properties and features of our Lu2O3:Eu scintillator material, fabricated by our electron-beam physical vapour deposition (EB-PVD) process, combines superior density of 9.5 g/cm3, microcolumnar structure emitting 48000 photons/MeV whose wavelength is an ideal match for the underlying CCD detector array. We grew thin films measuring 5–50μm in thickness as well as covering areas up to 5 × 5 cm2 which can be a suitable basis for microtomography, digital radiography as well as CT and hard X-ray Micro-Tomography (XMT).
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