The behavior of CCl4 and CHCl3 admixtures during the plasma synthesis of trichlorosilane via the hydrogenation of SiCl4 in a capacitively coupled radiofrequency (40.68 MHz) discharge was studied. It was shown that the main portion of the impurities undergo chemical transformations yielding silicon carbide and carbon. The degree of conversion determined from the impurity concentrations in the reactant SiCl4 and its hydrogenation products is strongly dependent on the processing parameters and reaches 99.9% for CCl4 and 96% for CHCl3.
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