RF planar magnetron sputtering has been adopted for obtaining superconducting BaPb1-xBixO3 (BPB) thin films. Using a target with excess Pb and Bi, smoothly surfaced BPB films with Tc above 9 K were obtained at a deposition rate as high as 400 Å/min. It was found that the film properties do not strongly depend on sputtering pressure and voltage as compared with that of the conventional sputtering method. Furthermore, the reproducibility has been greatly improved.