Abstract

The concept and theoretical basis of the three-component zone melting method is given for growing single crystals of semiconductor solid solutions using seeds from constituent components. In the Pfann approximation, the problem of the axial concentration distribution of components in Ge–Si single crystals grown at different values of the operating parameters such as the length of the melted zone and the composition of the initial macrohomogeneous rods of solid solutions is solved. Analysis of the obtained results determines the potentialities of the method and the optimal conditions for growing single crystals with given homogeneous and graded compositions in the entire continuous series of Ge–Si solid solutions. It is shown that the three-component zone-melting method is promising for the growth of single crystals of semiconductor solid solutions.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.