The Study on Preparation Process Optimization of Ceramic Membrane Layer

Abstract

The process of ion nitriding and multi-arc ion plating compound preparation Ti0.33Al0.67N membrane layer, it is the hot research spot of coating technology at present. Under the premise of this process, how to get better performance of thin-film coatings is the focus of research. Based on thin film deposition process parameters by orthogonal experimental design, an appropriate test process has been developed. Micro-hardness instrument is applied to test the surface hardness of the film and the droplet, By using scratch method to test the adhesion of coatings, analyzing the effect of a negative bias of substrate and nitrogen partial pressure, alloy target current process parameters on surface morphology of films, film thickness, adhesion and hardness has concluded the optimal process parameters. The results show, the thickness of the (Ti, Al) N super hard film that deposited by multi-arc ion plating technology is about 2.7 microns, through the deposition process optimization can achieve a high level of hardness (HV > 2600) and strong adhesion strength (>35 N).