Abstract
The optical and photocatalytic properties of TiO 2 are closely related to crystalline structures, such as rutile and anatase. In this paper, TiO 2 films were produced by inductively coupled plasma (ICP) assisted chemical vapor deposition (CVD) without extra heating of the substrate, and the effect of H 2 addition on the structure and optical properties of the films was investigated. After increasing the partial pressure of H 2, the structure of the TiO 2 films changed from anatase to rutile, which usually appears at high temperatures (> 600 °C). The light transmittance decreased with increasing the H 2 flow rate due to the increased surface roughness. The photocatalytic activity of the anatase TiO 2 film was better than that of the rutile TiO 2 film.
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