Synthesis of Helical and Supplementary Chirally Doped PMO Materials. Suitable Catalysts for Asymmetric Synthesis

Abstract

Exciting helical mesoporous organosilicas including supplementary chirally doped moieties into their spiral walls were one-pot successfully synthesized with good structural order for, to the best of our knowledge, the first time. This one-step direct synthesis of helical chirally doped periodic mesoporous organosilica (PMO) materials was carried out by combination of a tartrate-based bis-organosilicon precursor with tetraethyl orthosilicate (TEOS) and two surfactants, cetyltrimethylammonium bromide and perfluoroctanoic acid (CTAB and PFOA). For comparison purposes, a conventional two-step postsynthetic grafting methodology was carried out. In this method, the chiral tartrate-based moieties were grafted onto the helical silica mesoporous materials previously prepared by the dual-templating approach (CTAB and PFOA). The chirally doped materials prepared by both methodologies exhibited helical structure and high BET surface area, pore size distributions, and total pore volume in the range of mesopores. Solid-state (13)C and (29)Si MAS NMR experiments confirmed the presence of the chiral organic precursor in the silica wall covalently bonded to silicon atoms. Nevertheless, one-pot direct synthesis led to a greater control of surface properties and presented larger incorporation of organic species compared with the two-step postsynthetic methodology. To further prove the potential feasibility of these materials in enantiomeric applications, Mannich diastereoselective asymmetric synthesis was chosen as catalytic test. In the case of the one-pot PMO material, the rigidity of the chiral ligand backbone provided by its integration into the inorganic helical wall in combination with the steric impediments supplied by the twisted geometry led to the reagents to adopt specific orientations. These geometrical constrictions resulted in an outstanding diastereomeric induction toward the preferred enantiomer.