Abstract
Anatase phase TiO2 (a-TiO2) films have been deposited on MgAl2O4(111) substrates by the metal organic chemical vapor deposition (MOCVD) method at the substrate temperatures of 500-650°C. The structural analyses showed that the films were highly (004) oriented with tetragonal anatase structure and the epitaxial relationship was given as a-TiO2(004)||MgAl2O4 (111). The sample prepared at 600°C exhibited the best crystallization with a single-crystalline epitaxial film. The average transmittance of every TiO2 film in the visible range exceeded 90% excluding the influence of the substrate. The morphology and composition of the TiO2 films have also been studied in detail.
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