Abstract
Dual-frequency capacitively coupled plasmas (DF-CCPs) have been used to control the ion flux by the high-frequency source and the ion bombardment energy onto the electrode by the low-frequency (LF) source separately. However, an increase in the LF voltage, which extends the maximum ion energy to a higher value, causes the reduction of the bulk plasma length with a subsequent decrease of the plasma density. By using a one-dimensional particle-in-cell/Monte Carlo simulation code, the effect of the magnetic field on a DF-CCP is investigated to find whether the plasma can be sustained during the LF voltage increase. It is found that a low magnetic field can effectively maintain the plasma density and electron temperature constant with respect to the variation of the LF voltage.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
