Abstract
The argon excimer laser developed by ourselves has an ability to provide 10 16 photons within 5ns having energy as high as 9.8 eV. Radiation effects of the photons on quartz glass surfaces were studied with atomic force microscopy, X–ray photoelectron spectroscopy, and Raman scattering spectroscopy. The photons were found to change surface layers of quartz glass into crystalline silicon. High density excitons were generated and Si–O bonds were broken in thin surface layers of quartz glass with the high energy photons. Our findings indicate that VUV laser material processing offers a novel way to produce directly polycrystalline silicon in surface layers of insulating quartz glass plates.
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