Superhydrophobic modification of gate dielectrics for densely packed pentacene thin film transistors

Abstract

Pentacene organic thin film transistors (OTFTs) with low-k and high-k hybrid gate dielectrics by CF4 plasma treatment exhibited excellent device performance with field effect mobilities (maximum 1.41cm2∕Vs), a low threshold voltage of +1V, and on/off current ratios of 105 at −5V gate bias. After CF4 plasma treatment, fluorine atoms diffuse into the interior low-k polymer and eliminate ionic impurities which reduce the leakage current density and overall pentacene initial growth on the superhydrophobic surface is significantly improved. It seems apparent that proper surface treatment is desirable for higher quality pentacene film and improving the performance of OTFTs.