Abstract
AbstractSilica film coatings were demonstrated using photo-chemical vapor deposition with a 172-nm Xe excimer lamp. Tetraethoxyorthosilicate (TEOS) molecules were successfully dissociated into SiO2+2C2H5-OH+;(residual C and H) with the 7.2-eV photons. The films were deposited onto a quartz or Al203 single crystal substrate with the deposition rate of 1 nm/min. The films were uniform and smooth enough for optical applications.
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