Abstract

This paper presents a Schmitt Trigger (ST) based 12T1M non-volatile static random-access memory (nvSRAM) cell which significantly provides tolerance against process variations. The memristor M1 is connected between internal node Q and bitline RBL through read pass transistor. The impact of process variation is studied on margin and delay performances of proposed and existing read decoupled (RD) nvSRAM cells. The proposed cell achieves 1.62X, 1.17X and 1.33X higher write, read and hold margins, respectively, in comparison to existing RD nvSRAM cells. Furthermore, the maximum reduction in write, read and hold failure probabilities by 105×, 104× and 104×, respectively, is observed for proposed cell. The overall Vmin of proposed cell is found as 425 mV which is minimum among the existing RD counterparts. In addition, there is significant reduction in leakage power consumption and write/read delay deviation for the proposed cell. The store/restore performance of the proposed cell is same as most of the considered cells. All the comparison are made using 32 nm CMOS PTM model and at Vdd = 0.6 V. The effect of supply voltage variation is also studied on the performance of proposed and existing RD nvSRAM cells for the sake of completeness.

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