Quick preparation of thin films and nanosize powders by high-density ablation plasma produced by intense pulsed ion beam

Abstract

Summary form only given, as follows. Using high density ablation plasma produced by the intense pulsed ion beam interaction with solid targets, we have successfully prepared various kinds of thin films and ultrafine nanosize powders, which was named pulsed ion beam evaporation (IBE). Very quick and stoichiometric preparation is available by high density ablation plasma (density /spl sim/ 10/sup 19/ cm/sup -3/) in good vacuum, without heating substrate, and without post-annealing. Since we reported the preparation of thin films after the first demonstration in 1988, we only discuss the preparation of B/sub 4/C films in this paper. We believe this is the first demonstration in the world. As well known, B/sub 4/C is very hard after diamond, wear resistant, and stable at high temperature. The experiment was carried out by the intense pulsed proton beam interaction with B/sub 4/C target. From various diagnostics by XRD, FT-IR, FE-SEM, TEM, EELS, and Vickers hardness, we have confirmed the successful preparation of crystallized B/sub 4/C films as deposited. Absorptions associated with B-C bond have been clearly observed. In addition to a conventional front-side deposition, where a substrate is placed in front of the target, the preparation has been successful in back-side or mask-side configuration. The substrate was placed in the rear of the target holder or masked by the holder so that the primary ablation plume directly cannot arrive at the substrate. Good morphology has been observed on the surface of the films prepared. The maximum Vickers harness has been achieved to 2,300.