Properties of SiO 2 buffer layer for silica waveguide by flame hydrolysis deposition

Abstract

Si0 2 films were fabricated on Si substrates by flame hydrolysis deposition (FHD) as buffer layer of waveguides. The optical and surface properties of the films were characterized using scanning electron microanalyzer (SEM), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and variable angle spectroscopic ellipsometry (VASE). From a series of analyses, we demonstrated the excellent silica films fabricated. It proves that Si0 2 films prepared by flame hydrolysis deposition are entirely able to be applied in planar optical waveguides.