Abstract
Abstract SiO 2 films were fabricated on Si substrates by flame hydrolysis deposition (FHD) as buffer layer of waveguides. The optical and surface properties of the films were characterized using scanning electron microanalyzer, X-ray photoelectron spectroscopy, atomic force microscopy and variable angle spectroscopic ellipsometry. From a series of analyses, we demonstrated the excellent silica films fabricated. Consequently, it proves that SiO 2 films prepared by FHD are entirely able to be applied in planar optical waveguides.
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