Abstract
This paper is presented the properties of amorphous carbon (a‐C) thin films for solar cell application. Amorphous carbon thin films have been deposited on silicon substrate by thermal chemical vapor deposition (thermal‐CVD) method at various deposition temperatures. The surface morphology, electrical properties and crystallinity of these films have been studied using Analytical Scanning Electron Microscope (SEM) JEOL JSM‐6360LA, Current Voltage (I‐V) Measurement (Advantest R6243 DC Voltage Current Source/Monitor Software) and the D5000 Siemen Difractrometer (XRD) respectively . It was found that increasing deposition temperature had the most influence on the a‐C thin films properties. In addition the carrier gas flow also showed a secondary impact on the properties of a‐C thin films.
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