Abstract

Micron/sub-micron hard X-ray imaging is an important development direction of X-ray detection technology. Scintillation screens with excellent X-ray stopping power and high light output are desired to obtain good imaging quality. Europium-doped lutetium oxide (Lu2O3:Eu) film with micro-columnar structure is an ideal candidate for this application. In this study, micro-columnar structured Lu2O3:Eu films were prepared on quartz glass substrates by laser chemical vapor deposition (LCVD) method. The influences of preparation conditions on structure and morphology properties of films were investigated by X-ray diffraction (XRD) and scanning electron microscopy (SEM). Photoluminescence and scintillation properties of the films, including photoluminescence excitation (PLE), photoluminescence (PL), PL decay, X-ray excitation luminescence (XEL), and afterglow curves, were recorded. The relationships between structure, morphology, luminescence properties of films, and preparation conditions were investigated and discussed as well. The preparation conditions include laser power, oxygen flow rate, and precursor evaporation temperature. In addition, dual-layer Lu2O3:Eu film was prepared for the first time by just turning off the laser.

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