Abstract
Based on the measured spectra of Raman scattering, we obtained the data concerning the modification of the microstructure of silicon film synthesized with the use of the LCVD (laser chemical vapor deposition) method on amorphous glass substrate. Appearance of a polycrystalline phase of silicon was observed when the initial amorphous film was irradiated with high-power light pulses of a CO2 laser. Time resolved reflection spectra were measured for irradiating silicon films in situ. Was observed the polycrystalline film formation, moreover, films melting was not founded.© (1998) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.
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