Abstract
We present a new method for the fabrication of diffractive and refractive micro-optical components. The method is suitable for high-quality rapid prototyping of optical components and allows the fast experimental test of designs for computer-generated holograms or refractive microstructures. Our method is based on employing a digital-multimirror device (DMD) as a switchable projection mask. The DMD is imaged into a photoresist layer using a Carl Zeiss lithography objective with a demagnification of 10:1 and a numerical aperture of 0.32 on the image side. The resulting pixel size is 1.368×1.368 µm. In comparison with laser direct writing with a single spot, our method is a parallel processing of nearly 800,000 pixels (1024×768 pixels). This fabrication method can be applied to all MOEMS components. The method adds a new dimension in MOEMS processing, reducing the fabrication complexity, and improves the flexibility of process simulation and design.
Published Version
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