Abstract
We present a new method for the fabrication of diffractive and refractive microoptical components. The method is suitable for low-volume production, process development, high quality rapid prototyping of optical components and allows the fast experimental test of designs for a wide variety of different microoptical components e.g. computer generated holograms, blazed diffraction gratings or refrative microstructures. Our method is based on employing a computer-controlled digital-multi-micromirror device (DMD) as a switchable projection mask. The DMD is imaged into a photoresist layer using a Carl Zeiss lithography objective with a demagnification of 10:1 and a numerical aperture of 0.32 on the image side. The resulting pixel-size is 1.36 μm x 1.36μm. In comparison with laser direct writing with a single spot our method is a parallel processing of nearly 800000 pixels (1024 x 768).
Published Version
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