Abstract
A review of the recent advances and developments in the practical application of amorphous chalcogenide materials is presented, focusing special attention to holography and lithography. The main functional principles and practical application of amorphous chalcogenide photoresists for production of the embossed rainbow holograms and holographic optical elements are discussed. The laser interference lithography can be used as a low-cost method for the exposure of large surfaces with regular patterns like subwavelength-gratings and microsieves. The surface-relief and reftactive-index modulated gratings with a period of about 50 nm and less can be fabricated by immersion holographic method. The Bragg reflection gratings were recorded and studied in amorphous As<sub>2</sub>S<sub>3</sub> and As-S-Se films. The possibility to use the amorphous chalcogenide films as a media for holographic recording and storage of information with high density is discussed.
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