Abstract
A multilayer structure consisting of an indium tin oxide conducting layer, and a multi component barrier film (SiO2 and ITO) on polyethylenenapthalate is proposed as a transparent flexible substrate for flat panel displays and photovoltaic. The ITO and barrier films were deposited by DC magnetron sputtering and a facing target sputtering (FTS) system, respectively. To improve the multilayer film properties, a 30, 50, 80 nm-thick barrier layer was sputtered by FTS method prior to the ITO film sputtering process. The ITO films on the barrier film showed good properties due to the decreased lattice mismatch between the ITO and barrier film.
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