Abstract
We report the first evaluation of interface states present in GaAs p-n junctions regrown on a SiO2 masked substrate by selective molecular beam epitaxy. A constant-capacitance deep-level transient spectroscopy (CC-DLTS) method is extended to the regrown p-n junction case, and a technique to distinguish the DLTS signal emerging from bulk and interface states is employed. The extracted interface state density is in good agreement with predictions based on the unified disorder-induced gap state model.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
