Abstract
We report on the influence of surface reconstruction on silicon dopant incorporation and transport properties during molecular-beam epitaxy of GaAs(Bi) alloys. GaAs(Bi) growth with an (n × 3) reconstruction leads to n-type conductivity, while growth with a (2 × 1) reconstruction leads to p-type conductivity. We hypothesize that the presence or absence of surface arsenic dimers prevents or enables dopant incorporation into arsenic lattice sites. We consider the influence of bismuth anions on arsenic-dimer mediated dopant incorporation and the resulting electronic transport properties, demonstrating the applicability of this mechanism to mixed anion semiconductor alloys.
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