Improvement of instrumentation consistency using DUV filter in Spectroscopic Ellipsometry

Abstract

In the process of mass-production of semiconductors, it has been continuously required to determine whether the process is normal or not, and for this, it must be premised that the measurement equipment can produce reliable and consistent measurement data. However, Due to the denaturation of Working Reference Material (WRM), which is the basis for judging the accuracy and precision of the equipment, it is difficult to maintain the consistency of the instrument. In this study, the effect of preventing WRM denaturation was analyzed through optical path control in Spectroscopic Ellipsometry (SE) equipment. Therefore, by applying it to actual equipment, It is suggested methods to improve measurement equipment reliability.