Abstract
AbstractEpitaxial MgB2 thick films are grown on Al2O3 substrates at 600 °C by using the hybrid physical (HP)CVD technique. In order to obtain a high magnesium vapor pressure around the substrates, we use a special susceptor having a susceptor cap and achieve a very high growth rate of 0.17 μm min–1. Hexagonal‐shaped columnar structures are observed by cross‐sectional and planar‐view transmission electron microscope (TEM) images. For the 1.7 μm thick film, the Tc is observed to be 40.5 K with a Jc of 1.5 × 106 A cm–2 at 30 K. The vortex pinning mechanism by intercolumnar boundaries will be discussed.
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