Abstract
An investigation by high-voltage transmission electron microscopy and selected area diffraction of implanted iron layers is discussed. Phase transformations occur in thin films of iron after implantation with boron, carbon, nitrogen, silicon and phosphorus ions with energies of 30 to 60 keV in the dose range of 1 × 10 16 to 1 × 10 18 ions/cm 2. Implantation of B +, Si + or P + ions in iron produced an amorphous phase. A criterion is proposed to parametrize the occurence of amorphous metal-metalloid alloys after implantation. Crystalline stable and metastable phases in iron can be produced by B +, C + and N + ions bombardment. It is possible to give “state diagrams” of iron phases after metalloid ion implantation in the pretended dose range and temperature range. The phase transformation of the metastable to stable phase is discussed. The influence of implantation temperature is demonstrated in an example of formation of martensite.
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