Abstract
The structural effect of high-dose implantation of nitrogen (N 2 +) ions into iron, aluminium and nickel thin films has been investigated by high-voltage transmission electron microscopy (HVTEM) and selected area diffraction (SAD). It has been demonstrated that N 2 + acts as a glass former in these cases in the dose range between 8 × 10 17 and 1 × 10 18 N 2 + ions cm −2. The metastability of the films so produced is discussed in the light of their annealing behaviour.
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