直流マグネトロンスパタリング蒸着法の基板温度制御によるFe<sub>2.45</sub>Sm合金薄膜組織変化に伴う圧縮超磁歪と磁歪感受率

Abstract

Fe2.4Sm alloy thin films have been prepared by using a direct current magnetron sputtering process at different substrate temperatures from 323 K to 523 K under 0.5 Pa-argon gas pressures. All films prepared shows above 800 ppm. A magnetostriction and its magnetostrictive susceptibility have been strongly affected by the morphology change of the thin film. The giant magnetostriction values above 1000 ppm and high magnetostrictive susceptibility are obtained in homogeneous Fe2.45Sm amorphous alloy film deposited on a silicon substrate of 323 and from 403 to 473 K.