Abstract
SmFe2.2 alloy films were prepared by magnetron sputtering process. High magnetostrictive susceptibility was found under low residual gas pressure and low sputtering gas pressure at reduced substrate temperatures (Ts/K)/(Tm/K) from 0.30 to 0.37, where Ts and Tm are substrate temperature and melting point of SmFe2.2 alloy, respectively. The residual gas pressure dependence of magnetostrictive susceptibility was mainly explained by rate of samarium oxidation. Based on morphological change in Thornton's model, contributions of sputtering gas pressure and substrate temperatures were discussed.
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Schedule a callMore From: Journal of the Japan Institute of Metals and Materials
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