Abstract
We use high voltage electron beam lithography followed by electroplating to define small metal features on semiconductor substrates. These have been used to form high resolution etch masks, dense nanomagnet arrays, and highly anisotropic metal nanostructures. To reproducibly obtain uniform arrays of such structures, we have developed an end-point detection technique, which is based on in situ observation of the electrodeposition process.
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
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