Abstract

The transconductance of a silicon metal–oxide semiconductor field effect transistor with a neck in the middle was measured at liquid-nitrogen temperatures. The narrowest part of the gate with p+ isolations is 0.24 μm wide and about 0.2 μm long. The transconductance shows a peaked structure near the threshold voltage. The calculated transconductance based on the ballistic transport model of two-dimensional electron gas explains well the peaked structure.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.